AlInN/GaN heterostructures for X-band RF power amplification
Agency / Branch:
DOD / MDA
SETI proposed to develop the growth technology for lattice matched AlInN/GaN heterostructures and demonstrate the potential of this technology for high power, high frequency HFET RF power amplifiers. In Phase I, we successfully demonstrated MEMOCVDr growth of AlInN/GaN structures with Ga-free AlInN, the record sheet electron concentration and the record-breaking HFETs with peak drain currents exceeding 2 A/mm and ft and fmax above 100 GHz. Phase II program will focus on the optimization and scaleup of the growth technology. We will also demonstrate MOSHFET with current density higher than 2.5A/mm and cutoff frequency over 150GHz.
Small Business Information at Submission:
Sensor Electronic Technology, Inc.
1195 Atlas Road Columbia, SC 29209
Number of Employees: