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Novel Reactive Chemical Mechanical Polishing (RCMP) Technology for fabrication…
- Small Business Information
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Woman-Owned: NoMinority-Owned: NoHUBZone-Owned: No
- Phase 1
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Fiscal Year: 2010Title: Novel Reactive Chemical Mechanical Polishing (RCMP) Technology for fabrication of Large, Non-flat SiC mirrorsAgency / Branch: DOD / MDAContract: HQ0006-10-C-7341Award Amount: $100,000.00
Abstract:
Silicon Carbide (SiC) due to its superior thermal and mechanical properties serves as an attractive candidate as mirror material. The manufacturing of such mirrors is a critical challenge because of the hardness and chemical inertness of the material. The current state-of-the-art polishing methods are either typically very slow or introduce a high density of defects, scratches, or large stresses. Sinmat, in collaboration with Penn State University, plans to investigate a novel Reactive Chemical Mechanical Planarization (RCMP) method to rapidly polish non-planar SiC mirrors. This method is expected to be (2X to 10X) faster than conventional methods and has the ability to reduce/eliminate high and mid frequency surface roughness introduced by other methods. In the Phase I of this project, we plan to demonstrate the feasibility of this RCMP process to rapidly polish non-flat SiC mirrors, whereas in Phase II we plan to integrate the process with manufacturing companies, to fabricate large SiC mirrors.Small Business Information at Submission:Sinmat Inc
2153 Hawthorne Road GTEC Center, Suite 129, Box2 Gainesville, FL 32641EIN/Tax ID: 593645729DUNS: N/ANumber of Employees:Woman-Owned: NoMinority-Owned: NoHUBZone-Owned: No
Award Information
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Agency: Department of Defense |
Branch: Missile Defense Agency |
Award ID: 97005 |
Program Year/Program: 2010 / SBIR |
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Agency Tracking Number: B093-024-0518 |
Solicitation Year: N/A |
Solicitation Topic Code: MDA 09-024 |
Solicitation Number: N/A |