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Fast Ship Drag Reduction
- Small Business Information
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Woman-Owned: NoMinority-Owned: YesHUBZone-Owned: No
- Phase 1
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Fiscal Year: 1999Title: Fast Ship Drag ReductionAgency / Branch: DOD / DARPAContract: 98SB20095Award Amount: $98,949.00
Abstract:
Not Available Capacitors are formed by depositing a dielectric between two conductive plates. While fabrication techniques achieve outstanding levels of repeatabillity and consistency, many applications are difficult to fullfill with current manufacturing methods. A solid state resistor film may be trimmed to a certain value after deposition by the selective ablation of the resisting medium by a laser beam. A capacitor, however, is formed by the entrapment of a dielectric material between the metal conductors. We propose the development of a capacitor using a dielectric material that has a dielectric constant which may be altered by exposure to ultraviolet radiation after deposition to provide a basis for trimmable or tunable capacitive devices. This will involve the use of organosilicon materials plasma polymerized at room temperature and a photo oxidative polymer which when exposed to UV and oxygen will pattern and is alterable with UV dosage. As the literature shows no indication of work in this area discussions with users are needed to develop and identify specific areas of application.Small Business Information at Submission:Principal Investigator:
Eduard Amromin
7183770227Business Contact:
BELTRAN, INC.
1133 E. 35th Street Brooklyn, NY 11210EIN/Tax ID:DUNS: N/ANumber of Employees: N/AWoman-Owned: NoMinority-Owned: NoHUBZone-Owned: No
Award Information
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Agency: Department of Defense |
Branch: Defense Advanced Research Projects Agency |
Award ID: 44831 |
Program Year/Program: 1999 / SBIR |
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Agency Tracking Number: 98SB20095 |
Solicitation Year: N/A |
Solicitation Topic Code: N/A |
Solicitation Number: N/A |