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LOW COST MULTILAYERED PZT CAPACITORS MADE USING CCVD

Award Information

Agency:
Department of Defense
Branch:
Missile Defense Agency
Award ID:
25574
Program Year/Program:
1995 / SBIR
Agency Tracking Number:
25574
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
CCVD, Inc dba MicroCoating Technologies (MCT)
5315 Peachtree Industrial Blvd. Atlanta, GA 30341
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Woman-Owned: Yes
Minority-Owned: No
HUBZone-Owned: No
 
Phase 2
Fiscal Year: 1995
Title: LOW COST MULTILAYERED PZT CAPACITORS MADE USING CCVD
Agency / Branch: DOD / MDA
Contract: N/A
Award Amount: $748,147.00
 

Abstract:

Combustion chemical vapor deposition (CCVD), which was invented by the principal investigator, is a high quality film deposition technique that can inexpensively and quickly apply lead zirconate-titanate (PZT) thin films in a continuos manner. This technology can be used for the production of ferroelectric capacitors. CCVD is low cost, high quality and versatile. It does not require a reaction chamber or furnace, yet the thin films produced are comparable in quality to CVD films, and CCVD technology allows substrates to be passed through a depostion zone for multilayered, production line or large area coatings. We have produced CVD quality films of numerous materials using CCVD in the open atmosphere without a furnace or reaction chamber. Thin films of PZT will be grown using CCVD, and the stoichiometry, morphology, microstructure, and electrical properties of the films will be determined as a function of deposition conditions.

Principal Investigator:

Andrew Hunt, Phd
4048746550

Business Contact:

Small Business Information at Submission:

Ccvd, Inc.
430 Tenth Street, Nw, Suite N-008 Atlanta, GA 30318

EIN/Tax ID:
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No