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ALD for H2O and O2 Barriers for Flexible OLEDs

Award Information

Department of Defense
Defense Advanced Research Projects Agency
Award ID:
Program Year/Program:
2010 / SBIR
Agency Tracking Number:
Solicitation Year:
Solicitation Topic Code:
DARPA 10-001
Solicitation Number:
Small Business Information
Cambridge NanoTech, Inc.
68 Rogers St. Cambridge, MA 02142
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Woman-Owned: Yes
Minority-Owned: No
HUBZone-Owned: No
Phase 1
Fiscal Year: 2010
Title: ALD for H2O and O2 Barriers for Flexible OLEDs
Agency / Branch: DOD / DARPA
Contract: N10PC20169
Award Amount: $94,820.00


Atomic Layer Deposition (ALD) has been widely studied for water permeation barriers for flexible OLED displays. Inorganic films of approximately 100nm have been demonstrated to reduce the water vapor transmission rate (WVTR) to 6e-7 g/m^2/d at room temperature. However, these films crack at less than 2% strain. Inorganic ALD films cannot withstand the required 5% strain until their thickness is reduced to 5nm at which point the WVTR becomes unacceptably high. Hybrid inorganic/organic ALD films have demonstrated enhanced strain resilence but few chemistries have thus far been studied, and their optimized WVTR and mechanical flexibility have yet to be determined. We propose to investigate several classes of new precursor chemicals to generate hybrid inorganic/organic films to assess their applicability for encapsulating flexible OLED displays. Once the best chemistry has been identified and optimized, we will leverage our companies history of successful scaling to commercial manufacturing of ALD processes.

Principal Investigator:

Mark Sowa
Senior Research Scientist

Business Contact:

Ganesh Sundaram
Vice President of Research
Small Business Information at Submission:

Cambridge NanoTech, Inc.
68 Rogers St. Cambridge, MA 02142

EIN/Tax ID: 200324904
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No