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SBIR Phase II: Ultra-Low k Interlayer Dielectrics for 22 nm Technology Node and Beyond
Award Information
Agency: National Science Foundation
Branch: N/A
Contract: 0848490
Agency Tracking Number: 0711335
Amount:
$500,000.00
Phase:
Phase II
Program:
SBIR
Solicitation Topic Code:
EL
Solicitation Number:
NSF 06-598
Timeline
Solicitation Year:
N/A
Award Year:
2009
Award Start Date (Proposal Award Date):
N/A
Award End Date (Contract End Date):
N/A
Small Business Information
3110 SCHUETTE DRIVE
MIDLAND, MI
48642
United States
DUNS:
112223404
HUBZone Owned:
No
Woman Owned:
No
Socially and Economically Disadvantaged:
No
Principal Investigator
Name: Petar Dvornic
Title: PhD
Phone: (989) 832-5555
Email: dvornic@dendritech.com
Title: PhD
Phone: (989) 832-5555
Email: dvornic@dendritech.com
Business Contact
Name: Petar Dvornic
Title: PhD
Phone: (989) 832-5555
Email: dvornic@dendritech.com
Title: PhD
Phone: (989) 832-5555
Email: dvornic@dendritech.com
Research Institution
N/A
Abstract
This Small Business Innovation Research Phase II project is to develop a new technology for manufacturing ultra-low dielectric constant materials for leading-edge logic devices for the 22 nm technology node and beyond. The research approach is based on the bottom-up synthesis of honeycomb-like nano-structured films in which porogen component is pre-built into the nano-sized cells and can be decomposed in a strictly controlled manner. By extending microchip miniaturization this project may impact information technologies and related fields. This program may also significantly expand the overall knowledge and understanding of nano-structured materials and nanotechnology in general.
* Information listed above is at the time of submission. *
