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Point Of Use Chlorine Gas Generator For Wafer Fabrication

Award Information

Agency:
Department of Defense
Branch:
Defense Advanced Research Projects Agency
Award ID:
19726
Program Year/Program:
1993 / SBIR
Agency Tracking Number:
19726
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Electron Transfer Tech
155 Campus Plaza Edison, NJ 08818
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Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 1993
Title: Point Of Use Chlorine Gas Generator For Wafer Fabrication
Agency / Branch: DOD / DARPA
Contract: N/A
Award Amount: $62,420.00
 

Abstract:

A point of use generator for chlorine gas production is proposed. The generator would provide ultrahigh purity chlorine which is necessary to enhance the growth rate and decrease the impurity level in silicon oxides for silicon device fabrication. The generator will also eliminate the need for environmentally unacceptable organochlorine compounds which are presently used for oxide growth enhancement. ANTICIPATED BENEFITS: The chlorine generator could provide very high purity gas to enhance silicon oxide growth. This would improve silicon device performance and stability.

Principal Investigator:

William Ayers
6099210070

Business Contact:

Small Business Information at Submission:

Electron Transfer
P.o. Box 160 Princeton, NJ 08542

EIN/Tax ID:
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No