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LOW TEMPERATURE FABRICATION OF HIGH TC SUPERCONDUCTING THIN FILMS BY PLASMA…

Award Information

Agency:
Department of Defense
Branch:
Air Force
Award ID:
12454
Program Year/Program:
1991 / SBIR
Agency Tracking Number:
12454
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
EMCORE CORP.
394 Elizabeth Ave. Somerset, NJ 08873
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Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 2
Fiscal Year: 1991
Title: LOW TEMPERATURE FABRICATION OF HIGH TC SUPERCONDUCTING THIN FILMS BY PLASMA ENHANCED MOCVD PROCESS
Agency / Branch: DOD / USAF
Contract: N/A
Award Amount: $492,986.00
 

Abstract:

THE TECHNIQUE OF LOW TEMPERATURE IN SITU FORMATION OF HIGH TC SUPERCONDUCTING THIN FILMS IS CRUCIAL FOR EARLY APPLICATIONS OF COPPER OXIDE-BASED CERAMIC WITH SUPERCONDUCTIVITY ABOVE LIQUID NITROGEN TEMPERATURE. SUCH PROCESS WILL PERMIT DEPOSITION OF HIGH QUALITY, SMOOTH SURFACE AND HIGH DENSITY, HIGH TC SUPERCONDUCTING FILMS ON A VARIETY OF SUBSTRATES. THE PROPOSED NOVEL PROCESS SUBSTITUTES ELECTRON KINETIC ENERGY FOR CONVENTIONAL THERMAL ENERGY AND EHANCES COMPOUND FORMATION WITH THE PRESENCE OF ACTIVATED OXYGEN GENERATED FROM DISSOCIATION OF N(2)O, THUS OFFERS LOW TEMPERATURE DEPOSITION, NON-EQUILIBRIUM FILM COMPOSITIONS, AND HIGH PRODUCT PURITY. IN ADDITION CVD PROCESS OFFERS THE ADVANTAGES OF APPLICABLE TO INEXPENSIVE AND LARGE SCALE FABRICATION. OUR PRELIMINARY RESULTS DEMONSTRATED THAT TEXTURED, HIGH DENSITY, MIRROR SMOOTH SURFACE, AND LOW CARBON YBCO FILMS HAVE BEEN IN SITU FORMED AT A REDUCED TEMPERATURE AS LOW AS 570 DEG C. FURTHER REDUCING DEPOSITION TEMPERATURE BY INCREASING MICROWAVE PLASMA POWER IS PROPOSED. OUR RESULTS INDICATES THIS METHOD IS A PROMISING PROCESS FOR SUPERCONDUCTING DEVICE TECHNOLOGY.

Principal Investigator:

Dr Jing Zhao
2012719090

Business Contact:

Small Business Information at Submission:

Emcore Corp.
35 Elizabeth Ave Somerset, NJ 08873

EIN/Tax ID:
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No