USA flag logo/image

An Official Website of the United States Government

IMPROVED PRECURSORS FOR THE METALORGANIC CVD OF YBCO THIN FILMS

Award Information

Agency:
Department of Defense
Branch:
Missile Defense Agency
Award ID:
15627
Program Year/Program:
1991 / SBIR
Agency Tracking Number:
15627
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
EMCORE CORP.
394 Elizabeth Ave. Somerset, NJ 08873
View profile »
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 1991
Title: IMPROVED PRECURSORS FOR THE METALORGANIC CVD OF YBCO THIN FILMS
Agency / Branch: DOD / MDA
Contract: N/A
Award Amount: $49,315.00
 

Abstract:

THIS PROGRAM WILL DEVELOP SUITABLE PRECURSORS, PARTICULARLY FOR BARIUM WHICH EXHIBIT INCREASED VOLATILITY AND STABILITY IN THE METALORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) PROCESS OF HTSC FILMS BY PYROLYZING ORGANOMETALLIC PRECURSORS AT THE SUBSTRATE SURFACE. MOCVD OFFERS THE ADVANTAGES OF SCALE-UP CAPABILITY, HIGHLY OXIDIZING DEPOSITION CONDITIONS, LOW-TEMPERATURE DEPOSITION CAPABILITY, AND EXCELLENT COMPOSITIONAL CONTROL. IN CONTRAST TO THE CASE OF III/V COMPOUND SEMICONDUCTORS, THE PRECURSORS COMMONLY AVAILABLE FOR Y, BA AND CU ARE LOW VOLATILITY SOLIDS. WHICH UNFORTUNATELY NEED SUBSTANTIAL HEATING (125-250 DEGREES CELSIUS) TO OBTAIN USEFUL GROWTH RATES. THIS DEMANDS HIGH TEMPERATURE COMPONENTS, HEATED LINES AND A MORE COMPLEX MOCVD SYSTEM DESIGN. THE HIGH TEMPERATURE, THOUGH ENCOURAGE A SIGNIFCANT DEGREE WHICH ADVERSELY AFFECTS THE DEPOSITION PROCESS.

Principal Investigator:

Dr Peter E Norris
Principal Investigator
9082719090

Business Contact:

Small Business Information at Submission:

Emcore Corpon
35 Elizabeth Avenue Somerset, NJ 08873

EIN/Tax ID:
DUNS: N/A
Number of Employees: N/A
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No