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SBIR Phase I: A Low Cost Semiconductor Metallization-Planarization Process

Award Information

Agency:
National Science Foundation
Branch:
N/A
Award ID:
52632
Program Year/Program:
2001 / SBIR
Agency Tracking Number:
0060155
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Faraday TechNology, Inc.
315 Huls Drive Clayton, OH 45315-8983
View profile »
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 2001
Title: SBIR Phase I: A Low Cost Semiconductor Metallization-Planarization Process
Agency: NSF
Contract: 0060155
Award Amount: $99,182.00
 

Abstract:

This Small Business Innovation Research (SBIR) Phase I project will demonstrate the feasibility of an innovative process for copper metallization and planarization of semiconductor scale features. In contrast to geometric leveling or true leveling in the presence of levelers and brighteners, the proposed electrochemical deposition process is based on charge or Faradaic mediated leveling. The current copper metallization process utilizes a difficult to control plating bath containing levelers and brighteners and generates between 30 and 50 liters of waste slurry for each 8-inch wafer processed. The proposed charge modulated electrochemical deposition process will operate in a simple, easily controlled plating bath and will eliminate or substantially reduce the waste and cost of the current chemical/mechanical-processing step. During the Phase I program, the theoretical basis for the Faradaic mediated leveling process will be established and validated using state-of-the-art ULSI wafers. It is anticipated that the Faradaic mediated leveling process will eliminate or substantially reduce (i.e., by greater than 85%) the copper waste slurry and provide substantial cost savings relevant to the state-of-the-art copper metallization processes in the semiconductor industry

Principal Investigator:

E. Jennings Taylor
9378367749
jennings@erinet.com

Business Contact:

E Jennings Taylor
President
9378367749
jennings@erinet.com
Small Business Information at Submission:

Faraday Technology Inc
315 Huls Drive Clayton, OH 45315

EIN/Tax ID:
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No