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Company Information:
Name:
Inpria Corporation
Address:
2001 NW Monroe Ave
Suite 203
Corvallis, OR 97330-5510
Suite 203
Corvallis, OR 97330-5510
Located in HUBZone:
No
Woman-Owned:
No
Minority-Owned:
No
URL:
N/A
Phone:
(541) 913-9870
Award Totals:
Award List:
SBIR Phase I: Inorganic Electron Beam Resist for High Throughput Nanolithography
Award Year / Program / Phase:
2009 / SBIR / Phase I
Agency:
NSF
Principal Investigator:
Andrew Grenville, PhD
Award Amount:
$100,000.00
Abstract:
This Small Business Innovation Research Phase I project will assess the technical feasibility of developing a robust, high-speed inorganic electron-beam resist platform that will enable the manufacture of electronic devices with feature sizes < 30 nm. The requirements of high speed, low line-width… More
SBIR Phase II:Directly Patternable Inorganic Hardmask for Nanolithography
Award Year / Program / Phase:
2010 / SBIR / Phase II
Agency:
NSF
Principal Investigator:
Andrew Grenville
Award Amount:
$500,000.00
Abstract:
This Small Business Innovation Research (SBIR) Phase II project aims to develop a robust, high-speed inorganic resist platform to revolutionize the manufacture of semiconductor devices with feature sizes < 30 nm. At present, there is no demonstrated organic or inorganic resist that satisfies all of… More
SBIR Phase I:Aqueous Inks for High Performance Oxide Electronics
Award Year / Program / Phase:
2010 / SBIR / Phase I
Agency:
NSF
Principal Investigator:
Andrew Grenville, PhD
Award Amount:
$150,000.00
Abstract:
This Small Business Innovation Research (SBIR) Phase I project aims to develop semiconductor and dielectric inks for thin-film transistor devices to drive Active Matrix organic light-emitting diode (AMOLED) displays. The approach is to employ novel aqueous-based inorganic precursors with low energy… More
SBIR Phase II: Aqueous Precursors for High Performance Metal Oxide Thin Films
Award Year / Program / Phase:
2012 / SBIR / Phase II
Agency:
NSF
Principal Investigator:
Andrew Grenville
Award Amount:
$500,000.00
Abstract:
This Small Business Innovation Research (SBIR) Phase II project aims to develop spin-coatable liquid precursors for extremely high etch resistance pattern transfer layers (hardmasks) to enable novel devices in advanced integrated circuit manufacturing. The approach is to employ the fully inorganic… More