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IN SITU SURFACE ELEMENTAL ANALYSIS/PROCESS CONTROL AT MILLITORR PRESSURE DURING SUPERCONDUCTOR FILM DEPOSITION
Award Information
Agency: Department of Energy
Branch: N/A
Contract: N/A
Agency Tracking Number: 17486
Amount:
$50,000.00
Phase:
Phase I
Program:
SBIR
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Timeline
Solicitation Year:
N/A
Award Year:
1992
Award Start Date (Proposal Award Date):
N/A
Award End Date (Contract End Date):
N/A
Small Business Information
2215 Addison
Houston, TX
77030
United States
DUNS:
N/A
HUBZone Owned:
No
Woman Owned:
No
Socially and Economically Disadvantaged:
No
Principal Investigator
Phone: () -
Business Contact
Phone: () -
Research Institution
N/A
Abstract
THE HIGH PRESSURE LIMITS OF A NEW PROPRIETARY TECHNIQUE FOR SURFACE ELEMENTAL AND ISOTOPIC ANALYSIS ARE BEING EXPLORED. THE TECHNIQUE SHOULD BE USEFUL IN THE MILLITORR PRESSURE REGIME, THUS ALLOWING MEASUREMENT OF THIN FILM STOICHIOMETRY DURING GROWTH AND PROCESSING. THE PRESENT RESEARCH IS FOCUSING ON ANALYSIS OF YTTRIUM-BARIUM-COPPER-OXYGEN (YBCO) SUPERCONDUCTOR FILMS SUBJECTED TO HIGH PRESSURES OF OXYGEN. IN PHASE I, THE TECHNIQUE IS BEING CALIBRATED USING STANDARD YBCO SURFACES, ITS HIGH PRESSURE LIMIT IS BEING DETERMINED, AND REAL-TIME MEASUREMENT OF SUBSTRATE/THIN FILM INTERDIFFUSION IS BEING ATTEMPTED.
* Information listed above is at the time of submission. *
