SBIR/STTR Phase I: A simple and practical solid-state 157 nm coherent light source for applications in lithography development
This Small Business Innovation Research (SBIR) Phase I project proposes to study the feasibility of a
simple and practical narrow-bandwidth vacuum ultraviolet (VUV)laser light source,tunable
around 157 nm.This work will combine recent advances in laser technology and nonlinear-
optical techniques with previously-studied frequency-conversion schemes.A doubly-resonant
four-wave mixing in a guided-wave geometry will be used to convert UV light into the VUV.
Extrapolation from previously observed conversion efficiencies shows that the overall
conversion efficiency of this process may be increased by 100-1000x,from ~10 -4 to near-unity
efficiency.The laser system that will be developed to drive this process will be small-scale and
The commercial potential for such a device promises to radically-improve the practicality of VUV light sources over current laser systems,and will find immediate application as a tool for development of
157nm lithography for manufacturing of integrated circuits,and well as in a variety of other
basic science and technological applications.
Small Business Information at Submission:
Kapteyn-Murnane Laboratories LLC
4699 Nautilus Ct Unit 204 Boulder, CO 80301
Number of Employees: