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SBIR Phase I: EUV Source for Semiconductor Metrology

Award Information

Agency:
National Science Foundation
Branch:
N/A
Award ID:
90912
Program Year/Program:
2009 / SBIR
Agency Tracking Number:
0839349
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
KAPTEYN-MURNANE LABORATORIES, INC.
1855 South 57th Court Boulder, CO -
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Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 2009
Title: SBIR Phase I: EUV Source for Semiconductor Metrology
Agency: NSF
Contract: 0839349
Award Amount: $99,518.00
 

Abstract:

This Small Business Innovation Research Phase I project is to develop a coherent extreme ultraviolet (EUV) light source for industrial application in support of EUV lithography. The Broad impact of this project represents an area of fundamental interest to optical science. The High Harmonic Generation (HHG) process is the result of basic quantum physics at the extreme of high energy and short time scales. The development of phase matching techniques for HHG represents the precise coherent manipulation of matter on unprecedented short length and time scales. A further understanding may make it possible in future to generate coherent light at even shorter wavelengths, suitable for ultrahigh resolution biological imaging.

Principal Investigator:

Sterling Backus
PhD
3035449068
sbackus@kmlabs.com

Business Contact:

Sterling Backus
PhD
3035449068
sbackus@kmlabs.com
Small Business Information at Submission:

KAPTEYN-MURNANE LABS INC
1855 S. 57TH CT Boulder, CO 80301

EIN/Tax ID: 200117004
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No