SBIR Phase I: EUV Source for Semiconductor Metrology
This Small Business Innovation Research Phase I project is to develop a coherent extreme ultraviolet (EUV) light source for industrial application in support of EUV lithography. The Broad impact of this project represents an area of fundamental interest to optical science. The High Harmonic Generation (HHG) process is the result of basic quantum physics at the extreme of high energy and short time scales. The development of phase matching techniques for HHG represents the precise coherent manipulation of matter on unprecedented short length and time scales. A further understanding may make it possible in future to generate coherent light at even shorter wavelengths, suitable for ultrahigh resolution biological imaging.
Small Business Information at Submission:
KAPTEYN-MURNANE LABS INC
1855 S. 57TH CT Boulder, CO 80301
Number of Employees: