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Company Information:

Company Name: Lumarray, Inc.
City: SOMERVILLE
State: MA
Zip+4: -
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
Phone: (617) 253-6865

Award Totals:

Program/Phase Award Amount ($) Number of Awards
SBIR Phase I $492,002.00 5
SBIR Phase II $3,718,035.00 6
STTR Phase I $99,916.00 1
STTR Phase II $749,934.00 1

Award List:

Maskless Lithography for Fabrication of Microelectronics with 100 nm Features

Award Year / Program / Phase: 2004 / SBIR / Phase I
Agency / Branch: DOD / DARPA
Principal Investigator: Henry I. Smith, Founder
Award Amount: $42,150.00
Abstract:
We propose to investigate the feasibility of achieving a throughput of at least one 200 mm diameter wafer per hour, while incorporating a sub-200nm wavelength source into a maskless lithography system of the Zone-Plate-Array Lithography architecture. We will evaluate sources at 193, 157, 121, 13… More

Maskless Lithography for Fabrication of Microelectronics with 100 nm Features

Award Year / Program / Phase: 2005 / SBIR / Phase II
Agency / Branch: DOD / DARPA
Principal Investigator: Henry I. Smith, President
Award Amount: $749,257.00
Abstract:
The proposed Phase II program will produce in 1 year a low-cost, flexible, maskless-lithography tool, the Model 150A, capable of patterning arbitrary-geometries at minimum half-pitch features of 150 nm. This tool will meet the unique needs of DOD and ASIC practitioners for custom circuits, as well… More

SBIR Phase I: Optical-Maskless-Lithography Equipment

Award Year / Program / Phase: 2005 / SBIR / Phase I
Agency: NSF
Principal Investigator: Rajesh Menon, Dr
Award Amount: $99,924.00
Abstract:
This Small Business Innovation Research (SBIR) Phase I research project is a step towards building an optical-maskless-lithography technology that could revolutionize patterning for a large variety of applications such as MEMs, microfluidics, biochips, microelectronics, microphotonics,… More

SBIR Phase II: Optical-Maskless-Lithography Equipment

Award Year / Program / Phase: 2006 / SBIR / Phase II
Agency: NSF
Principal Investigator: Rajesh Menon, Dr
Award Amount: $499,943.00
Abstract:
This Small Business Innovation Research (SBIR) Phase II project is a major step in the development of an optical-maskless lithography technology that is capable of high resolution, high throughput, flexibility, low cost, and extendibility. Current lithography technologies suffer from the problems of… More

Zone-Plate-Array Lithography for Mask Making and Military Integrated-Circuit (IC) Manufacturing

Award Year / Program / Phase: 2007 / SBIR / Phase I
Agency / Branch: DOD / NAVY
Principal Investigator: Henry I. Smith, Principal Investigator
Award Amount: $149,965.00
Abstract:
The zone-plate-array-lithography (ZPAL) system being commercialized by Lumarray, Inc. (the ZP-150) is proposed as the ideal means of providing quick turn-around on masks for DoD integrated-circuit manufacturing, as well as for maskless direct patterning of wafers. We propose to deliver 10… More

SBIR Phase I: Dual-Wavelength Diffractive Optics for Absorbance-Modulation Optical Lithography

Award Year / Program / Phase: 2008 / SBIR / Phase I
Agency: NSF
Principal Investigator: Rajesh Menon, PhD
Award Amount: $99,999.00
Abstract:
This Small Business Innovation Research Phase I project is to design dual wavelength diffractive optics for maskless absorbance modulation optical lithography. Absorbance-modulation optical lithography (AMOL) can achieve nanoscale resolution, while getting rid of the expensive photomask. … More

Zone-Plate-Array Lithography for Mask Making and Military Integrated-Circuit (IC) Manufacturing

Award Year / Program / Phase: 2008 / SBIR / Phase II
Agency / Branch: DOD / NAVY
Principal Investigator: Henry I. Smith, PI
Award Amount: $749,988.00
Abstract:
LumArray, Inc. proposes under Phase II to further improve its maskless zone-plate-array lithography system, to meet the requirements of manufacturers of custom chips for the DoD. Under Phase I, a prototype alpha tool was developed, the ZP-150ATM. Under Phase II we will develop and demonstrate a… More

SBIR Phase I: Nanometer-Level Fidelity in Maskless Lithography

Award Year / Program / Phase: 2009 / SBIR / Phase I
Agency: NSF
Principal Investigator: Henry I. Smith, PhD
Award Amount: $99,964.00
Abstract:
This Small Business Innovation Research Phase I project will investigate the feasibility of achieving, by means of precision measurement and software corrections, sub-1nm feature-size control and 1nm feature-placement precision using its maskless-lithography tool based on zone-plate-array… More

SBIR Phase II: Dual-Wavelength Diffractive Optics for Absorbance-Modulation Optical Lithography

Award Year / Program / Phase: 2009 / SBIR / Phase II
Agency: NSF
Principal Investigator: Henry I. Smith, PhD
Award Amount: $468,979.00
Abstract:
This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5). This Small Business Innovation Research (SBIR) Phase II project aims to develop an optical-maskless-lithography technology that is capable of high resolution, high throughput, flexibility, low cost,… More

Nanometer Precision in Maskless Lithography via Software

Award Year / Program / Phase: 2010 / SBIR / Phase II
Agency / Branch: DOD / DARPA
Principal Investigator: Henry Smith, President
Award Amount: $750,000.00
Abstract:
LumArray, Inc. proposes under Phase II to further improve its maskless zone-plate-array lithography system, to meet the requirements of manufacturers of custom chips for the DoD. Under Phase I, a prototype alpha tool was developed, the ZP-150ATM. Under Phase II we will develop and demonstrate a beta… More

SBIR Phase II: Nanometer-Level Fidelity in Maskless Lithography

Award Year / Program / Phase: 2011 / SBIR / Phase II
Agency: NSF
Principal Investigator: Henry I. Smith
Award Amount: $499,868.00
Abstract:
This Small Business Innovation Research (SBIR) Phase II project aims to develop a maskless photolithography system by ensuring that the patterns it writes are free of positional error (i.e., distortion) to the sub-1 nm level. In traditional photolithography, distortion minimization depends on the… More

Flexible Micro- and Nano-Patterning Tools for Photonics

Award Year / Program / Phase: 2011 / STTR / Phase I
Agency / Branch: DOD / OSD
Research Institution: University of Utah
Principal Investigator: Henry I. Smith, Principal Investigator – (617) 253-6865
Award Amount: $99,916.00
RI Contact: Todd B. Nilsen
Abstract:
LumArray, Inc. is developing, and in 4 months will deliver to NIST, a maskless photolithography system of low cost that will meet the specifications for resolution, placement accuracy, overlay, throughput and multilevel alignment required in photonic devices. In Phase I, complex and dense patterns… More

Flexible Micro- and Nano-Patterning Tools for Photonics

Award Year / Program / Phase: 2012 / STTR / Phase II
Agency / Branch: DOD / OSD
Research Institution: University of Utah
Principal Investigator: Henry I. Smith, PI – (617) 253-6865
Award Amount: $749,934.00
RI Contact: Gary C. J.d.
Abstract:
This Phase II STTR proposal seeks to enhance the throughput and resolution of LumArray"s maskless photolithography system, the ZP-150, so that it meets the needs of photonic systems for high-fidelity, long-range spatial-phase coherence, full-wafer coverage, 3D structuring, patterning on… More