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Maskless Lithography for Fabrication of Microelectronics with 100 nm Features

Award Information

Agency:
Department of Defense
Branch:
Defense Advanced Research Projects Agency
Award ID:
68747
Program Year/Program:
2004 / SBIR
Agency Tracking Number:
03SB2-0444
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Lumarray, Inc.
15 WARD STREET SOMERVILLE, MA -
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Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 2004
Title: Maskless Lithography for Fabrication of Microelectronics with 100 nm Features
Agency / Branch: DOD / DARPA
Contract: W31P4Q-04-C-R109
Award Amount: $42,150.00
 

Abstract:

We propose to investigate the feasibility of achieving a throughput of at least one 200 mm diameter wafer per hour, while incorporating a sub-200nm wavelength source into a maskless lithography system of the Zone-Plate-Array Lithography architecture. We will evaluate sources at 193, 157, 121, 13 and 4.5 nm, as well as a variety of sub-200 nm lamp sources.

Principal Investigator:

Henry I. Smith
Founder
6172536865
hismith@nano.mit.edu

Business Contact:

Nicholas P. Economou
CEO
7818620084
neconomou@rcn.com
Small Business Information at Submission:

LUMARRAY LLC
60 Vassar Street, Bldg. 39, Room 427 Cambridge, MA 02139

EIN/Tax ID: 550815121
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No