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SBIR Phase I: Nanometer-Level Fidelity in Maskless Lithography

Award Information

Agency:
National Science Foundation
Branch:
N/A
Award ID:
91027
Program Year/Program:
2009 / SBIR
Agency Tracking Number:
0912420
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
LumArray, Inc.
15 Ward Street Somerville, MA 02143-4241
View profile »
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 2009
Title: SBIR Phase I: Nanometer-Level Fidelity in Maskless Lithography
Agency: NSF
Contract: 0912420
Award Amount: $99,964.00
 

Abstract:

This Small Business Innovation Research Phase I project will investigate the feasibility of achieving, by means of precision measurement and software corrections, sub-1nm feature-size control and 1nm feature-placement precision using its maskless-lithography tool based on zone-plate-array lithography (ZPAL). Several components of the semiconductor industry currently require nanometer-level patterning fidelity, in particular imprint templates, photonic devices and photonic intrachip communication. Future nanotechnology applications will also require such fidelity. By incorporating absorbance-modulation optical lithography into ZPAL, lithographic resolution below 20 nm should be achieved, enabling ZPAL to outperform electron-beam lithography in the important metrics of: throughput, resolution, overlay, feature-size control, feature-placement accuracy and size of field. This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5).

Principal Investigator:

Henry I. Smith
PhD
6172536865
hismith@lumarray.com

Business Contact:

Henry I. Smith
PhD
6172536865
hismith@lumarray.com
Small Business Information at Submission:

LUMARRAY LLC
15 WARD ST Somerville, MA 02143

EIN/Tax ID: 202394522
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No