Based on the previous extensive work on NIL in Prof. Chou's group and at Nanonex Corporation, the objective of the project is to further develop a promising innovative nanoimprint lithography (NIL) machine design. The design, using a new principle, offersnot only excellent uniformity of… More

This small business innovation research phase-I project will provide the design and the proof-of-principle demonstration of high-performance wide-angle, broadband (over the visible spectrum) polarizing beam-splitters. The proposed polarizing beam-splitters(PBSs) use nano-wire-grid as the… More

"The objective of the Phase II project is to further develop, complete and commercialize a unique nanoimprint lithography (NIL) machine that was designed and developed in phase I. The key personnel involved in the project are former Post-docs and graduatestudents of Prof. Chou's group, and are… More

"The goal of the project is to develop nanoimprint lithography based fabrication processes for low-cost, parallel patterning of magnetic device structures of a size below 50 nm feature size. In particular, nanoimprint lithography (NIL) and reactive ionetching (RIE) of nanoscale rectangles and… More

Nanonex is successfully finishing the SBIR Phase I project and has developed a unique nanoimprint tool, Voyager-I that offers unprecedented fast operation and excellent nanostructure uniformity over a large area. In Phase II, Nanonex will focus on furtherimprovements, production, and… More

The goal of the project is to (a) further develop an innovative in-situ real-time characterization tool for nanoimprint lithography (NIL) processes and (b) in-situ template cleaning using a laser beam. The characterization tool is based on real-time diffractive scatterometry and can measure many… More

The objective of the proposal is to explore and develop innovative nanoimprint lithography (NIL) mask technologies including mask structures, mask fabrication methods and mask coatings. These new technologies will significantly improve the quality and lower the cost of NIL masks and NIL processes… More

This Small Business Innovation Research (SBIR) Phase I research project will investigate the critical issues and feasibility of developing new Nano-Imprint Lithography (NIL) machines using an innovative approach in pressing a mold into the resist. The new approach, coined electrostatic force… More

The objective of the Phase-II proposal is to, based on the accomplishments of Phase-I, further explore and develop innovative nanoimprint lithography (NIL) mask technologies for sub-45 nm node, including mask structures, mask fabrication methods and mask coatings. In particular, we will further… More

This SBIR Phase I project is to fabricate subwavelength optical polarimetery array (SOPA) for polarization enhanced imaging using nanofabrication technology based on nanoimprint lithography. Polarization imaging will not only enhance imaging quality such as contrast, but also reveal chemical… More

In order to diminish the second corollary of Moores Law (the cost of the manufacturing technology increases geometrically with time), Nanonex proposes the use of templates with gratings that can be manufactured at a low-cost by nanoimprint lithography (NIL). These templates are base wafers… More

The goal of this proposed work is to explore and develop an innovative patterning method of sub-wavelength structures using roll-to-roll proceesing (patterning, pattern transfer and pattern placement). The proposed solution aims to achieve high throughput, low resolution, and capable of patterning… More

We propose a large area low cost manufacturing process for diffraction gratings with very small line-edge-roughness (LER) and defect-free surface using self-perfection by liquefaction (SPEL) and nanoimprint lithography (NIL). The manufacturing process is capable of producing diffraction gratings… More