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Company Information:

Company Name:
Nanonex Corporation
Address:
1 DEERPARK DR STE O
MONMOUTH JUNCTION, NJ 08852-1920
Phone:
(732) 355-1600
URL:
EIN:
223672235
DUNS:
108972048
Number of Employees:
9
Woman-Owned?:
No
Minority-Owned?:
No
HUBZone-Owned?:
No

Commercialization:

Has been acquired/merged with?:
N/A
Has had Spin-off?:
N/A
Has Had IPO?:
N/A
Year of IPO:
N/A
Has Patents?:
N/A
Number of Patents:
N/A
Total Sales to Date $:
$ 0.00
Total Investment to Date $
$ 0.00
POC Title:
N/A
POC Name:
N/A
POC Phone:
N/A
POC Email:
N/A
Narrative:
N/A

Award Totals:

Program/Phase Award Amount ($) Number of Awards
SBIR Phase I $985,089.00 10
SBIR Phase II $1,124,923.00 2
STTR Phase I $198,905.00 3
STTR Phase II $500,000.00 1

Award List:

N/A

Award Year / Program / Phase:
2000 / STTR / Phase I
Award Amount:
$99,000.00
Agency / Branch:
DOD / DARPA
Principal Investigator:
Jian Wang, Vice President
Research Institution:
PRINCETON UNIV.
RI Contact:
Michelle Christy
Abstract:
N/a

Innovative, High-Throughput, Large-Area, Versatile Nanoimprint Tools

Award Year / Program / Phase:
2001 / SBIR / Phase I
Award Amount:
$99,000.00
Agency / Branch:
DOD / DARPA
Principal Investigator:
Linshu Kong, Project Manager
Abstract:
Based on the previous extensive work on NIL in Prof. Chou's group and at Nanonex Corporation, the objective of the project is to further develop a promising innovative nanoimprint lithography (NIL) machine design. The design, using a new principle, offersnot only excellent uniformity of… More

High Performance Nano-Wire-Grid Wide-angle Broadband Polarizing Beamsplitters

Award Year / Program / Phase:
2001 / SBIR / Phase I
Award Amount:
$70,000.00
Agency / Branch:
DOD / ARMY
Principal Investigator:
Jian Jim Wang, Vice President
Abstract:
This small business innovation research phase-I project will provide the design and the proof-of-principle demonstration of high-performance wide-angle, broadband (over the visible spectrum) polarizing beam-splitters. The proposed polarizing beam-splitters(PBSs) use nano-wire-grid as the… More

Development of Innovative Nanoimprint Lithography Tools

Award Year / Program / Phase:
2002 / STTR / Phase I
Award Amount:
$0.00
Agency / Branch:
DOD / DARPA
Principal Investigator:
Larry Koecher, Vice President
Research Institution:
Princeton University
RI Contact:
Michelle Christy
Abstract:
"The objective of the Phase II project is to further develop, complete and commercialize a unique nanoimprint lithography (NIL) machine that was designed and developed in phase I. The key personnel involved in the project are former Post-docs and graduatestudents of Prof. Chou's group, and are… More

Nanoimprint Lithography of Parallel Patterning of Nanoscale Magenetoelectronic Devices

Award Year / Program / Phase:
2002 / SBIR / Phase I
Award Amount:
$69,852.00
Agency / Branch:
DOD / NAVY
Principal Investigator:
Linshu Kong, Project Manager
Abstract:
"The goal of the project is to develop nanoimprint lithography based fabrication processes for low-cost, parallel patterning of magnetic device structures of a size below 50 nm feature size. In particular, nanoimprint lithography (NIL) and reactive ionetching (RIE) of nanoscale rectangles and… More

Innovative, High-Throughput, Large-Area, Versatile Nanoimprint Tools

Award Year / Program / Phase:
2003 / SBIR / Phase II
Award Amount:
$375,000.00
Agency / Branch:
DOD / DARPA
Principal Investigator:
Larry Koecher, Vice President
Abstract:
Nanonex is successfully finishing the SBIR Phase I project and has developed a unique nanoimprint tool, Voyager-I that offers unprecedented fast operation and excellent nanostructure uniformity over a large area. In Phase II, Nanonex will focus on furtherimprovements, production, and… More

In-situ, Real-Time Process Characterization and Control in Nanoimprint Lithography and In-Situ Template Cleaning

Award Year / Program / Phase:
2004 / SBIR / Phase I
Award Amount:
$98,905.00
Agency / Branch:
DOD / DARPA
Principal Investigator:
Abstract:
The goal of the project is to (a) further develop an innovative in-situ real-time characterization tool for nanoimprint lithography (NIL) processes and (b) in-situ template cleaning using a laser beam. The characterization tool is based on real-time diffractive scatterometry and can measure many… More

Innovative Nanoimprint Lithography Mask Technology for Sub-45 nm Features

Award Year / Program / Phase:
2005 / SBIR / Phase I
Award Amount:
$98,922.00
Agency / Branch:
DOD / DARPA
Principal Investigator:
Larry Koecher, Chief Operating Officer
Abstract:
The objective of the proposal is to explore and develop innovative nanoimprint lithography (NIL) mask technologies including mask structures, mask fabrication methods and mask coatings. These new technologies will significantly improve the quality and lower the cost of NIL masks and NIL processes… More

SBIR Phase I: Development of Innovative Nanoimprint Machines Based on Electrostatic-Force Assisted NIL (EFAN)

Award Year / Program / Phase:
2005 / SBIR / Phase I
Award Amount:
$99,982.00
Agency:
NSF
Principal Investigator:
Abstract:
This Small Business Innovation Research (SBIR) Phase I research project will investigate the critical issues and feasibility of developing new Nano-Imprint Lithography (NIL) machines using an innovative approach in pressing a mold into the resist. The new approach, coined electrostatic force… More

Innovative Nanoimprint Lithography Mask Technology for Sub-45 nm Features

Award Year / Program / Phase:
2006 / SBIR / Phase II
Award Amount:
$749,923.00
Agency / Branch:
DOD / DARPA
Principal Investigator:
Linshu Kong, Manager
Abstract:
The objective of the Phase-II proposal is to, based on the accomplishments of Phase-I, further explore and develop innovative nanoimprint lithography (NIL) mask technologies for sub-45 nm node, including mask structures, mask fabrication methods and mask coatings. In particular, we will further… More

SBIR Phase I: Innovative Design and Fabrication of Subwavelength Optical Polarimetry Array (SOPA) for Polarization Enhanced Imaging

Award Year / Program / Phase:
2007 / SBIR / Phase I
Award Amount:
$99,682.00
Agency:
NSF
Principal Investigator:
Abstract:
This SBIR Phase I project is to fabricate subwavelength optical polarimetery array (SOPA) for polarization enhanced imaging using nanofabrication technology based on nanoimprint lithography. Polarization imaging will not only enhance imaging quality such as contrast, but also reveal chemical… More

Low Cost, Sub-32nm Hybrid Imprint & E-beam Template for Low-Volume Manufacturing

Award Year / Program / Phase:
2009 / SBIR / Phase I
Award Amount:
$98,984.00
Agency / Branch:
DOD / DARPA
Principal Investigator:
Linshu Kong, Product Manager
Abstract:
In order to diminish the second corollary of Moores Law (the cost of the manufacturing technology increases geometrically with time), Nanonex proposes the use of templates with gratings that can be manufactured at a low-cost by nanoimprint lithography (NIL). These templates are base wafers… More

Sub-wavelength Structure Patterning Using Roll-to-Roll Processing

Award Year / Program / Phase:
2011 / STTR / Phase I
Award Amount:
$99,905.00
Agency / Branch:
DOD / OSD
Principal Investigator:
Chong Huang, Research and Application Manager – (732) 355-1600
Research Institution:
Princeton University
RI Contact:
Jeffrey Friedland
Abstract:
The goal of this proposed work is to explore and develop an innovative patterning method of sub-wavelength structures using roll-to-roll proceesing (patterning, pattern transfer and pattern placement). The proposed solution aims to achieve high throughput, low resolution, and capable of patterning… More

Large area low cost manufacturing process for precision diffraction gratings with very small line-edge-roughness (LER) and defect-free surface coverin

Award Year / Program / Phase:
2011 / SBIR / Phase I
Award Amount:
$99,981.00
Agency:
DOD
Principal Investigator:
Chong Huang, Product Development Manager
Abstract:
We propose a large area low cost manufacturing process for diffraction gratings with very small line-edge-roughness (LER) and defect-free surface using self-perfection by liquefaction (SPEL) and nanoimprint lithography (NIL). The manufacturing process is capable of producing diffraction gratings… More

SBIR Phase I: Nano-textured Light Management Layers Fabricated by a Roll-to-Roll (R2R) Nanoimprint Manufacturing Process - Significant Impacts to The Solar Photovoltaic Industry

Award Year / Program / Phase:
2013 / SBIR / Phase I
Award Amount:
$149,781.00
Agency:
NSF
Principal Investigator:
Abstract:
This Small Business Innovation Research (SBIR) Phase I project will develop and commercialize innovative light management films that will improve the efficiencies, reduce manufacturing costs, and benefit the overall deployment economics of wafer- and film crystalline-silicon (c-Si) solar… More