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Home » Awards » Innovative, High-Throughput, Large-Area, Versatile Nanoimprint Tools

Innovative, High-Throughput, Large-Area, Versatile Nanoimprint Tools

Award Information

Agency: Department of Defense	Branch: Defense Advanced Research Projects Agency	Award ID: 53333	Program Year/Program: 2001 / SBIR
Agency Tracking Number: 01SB2-0142	Solicitation Year: N/A	Solicitation Topic Code: N/A	Solicitation Number: N/A

Small Business Information: NANONEX CORPORATION
1 Deer Park Drive Suite O Monmouth Junction, NJ -
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Woman-Owned: No

Minority-Owned: No

HUBZone-Owned: No

Phase 1: Fiscal Year: 2001

Title: Innovative, High-Throughput, Large-Area, Versatile Nanoimprint Tools

Agency / Branch: DOD / DARPA

Contract: DAAH0102CR059

Award Amount: $99,000.00

Abstract:
Based on the previous extensive work on NIL in Prof. Chou's group and at Nanonex Corporation, the objective of the project is to further develop a promising innovative nanoimprint lithography (NIL) machine design. The design, using a new principle, offersnot only excellent uniformity of nanostructures over large areas, high-throughput (<60 sec per wafer), and scalable to 12

Principal Investigator:
Linshu Kong
Project Manager
6096833973
lkong@nanonex.com

Business Contact:
Lin Chou
President
6096833973
linchou@nanonex.com

Small Business Information at Submission:

NANONEX CORP.
7 FOULET DRIVE PRINCETON, NJ 08540

EIN/Tax ID: 223672235

DUNS: N/A

Number of Employees:

Woman-Owned: No

Minority-Owned: No

HUBZone-Owned: No