Fiscal Year:
2002
Title:
Nanoimprint Lithography of Parallel Patterning of Nanoscale Magenetoelectronic Devices
Agency / Branch:
DOD / NAVY
Contract:
N00014-02-M-0115
Award Amount:
$69,852.00
Abstract:
"The goal of the project is to develop nanoimprint lithography based fabrication processes for low-cost, parallel patterning of magnetic device structures of a size below 50 nm feature size. In particular, nanoimprint lithography (NIL) and reactive ionetching (RIE) of nanoscale rectangles and hollow cylinders in insulators will be studied. A variety of NIL masks will be fabricated using electron-beam lithography and RIE. NIL processes, resists and machines will be investigated to make them suitable tomeet the particular needs of fabrication of nanomagnetoelectronic devices. A variety of reactive ion etching (RIE) recipes will be explored to ensure the high-fidelity etching of these nanoscale structures.Several key technical personnel of Nanonex Corporation are former post-docs and graduate students of Prof. Chou of Princeton University's group, and are experts in nanofabrication, particularly NIL, RIE, and nanomagnetic structures. Professor Chou willserve as a consultant to the proposed project. The success of the proposed project will present a significant step forward in fabricating nanoscale magneto-electronic devices. Such devices are essential to many Navy and other military hardwires. Thefabrication technology can also benefit other nanostructures needed in military and civilian applications."
Small Business Information at Submission:
Nanonex Corp.
7 FOULET DRIVE PRINCETON, NJ 08540
EIN/Tax ID:
223672235
DUNS:
N/A
Number of Employees:
Woman-Owned:
No
Minority-Owned:
No
HUBZone-Owned:
No