In-situ, Real-Time Process Characterization and Control in Nanoimprint Lithography and In-Situ Template Cleaning
Agency / Branch:
DOD / DARPA
The goal of the project is to (a) further develop an innovative in-situ real-time characterization tool for nanoimprint lithography (NIL) processes and (b) in-situ template cleaning using a laser beam. The characterization tool is based on real-time diffractive scatterometry and can measure many important imprint parameters (e.g. imprint depth, imprint speed, the resist deformations, etc) in-situ and real time. The tool can uniquely and significantly enhance the performance and yields of NIL. The innovative method is based on some recent developments at Prof. Chou's group and licensed to Nanonex Corporation.
Small Business Information at Submission:
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