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Innovative Nanoimprint Lithography Mask Technology for Sub-45 nm Features

Award Information

Agency:
Department of Defense
Branch:
Defense Advanced Research Projects Agency
Award ID:
74279
Program Year/Program:
2006 / SBIR
Agency Tracking Number:
04SB3-0244
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Nanonex Corporation
1 DEERPARK DR STE O MONMOUTH JUNCTION, NJ 08852-1920
View profile »
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 2
Fiscal Year: 2006
Title: Innovative Nanoimprint Lithography Mask Technology for Sub-45 nm Features
Agency / Branch: DOD / DARPA
Contract: W31P4Q-06-C-0104
Award Amount: $749,923.00
 

Abstract:

The objective of the Phase-II proposal is to, based on the accomplishments of Phase-I, further explore and develop innovative nanoimprint lithography (NIL) mask technologies for sub-45 nm node, including mask structures, mask fabrication methods and mask coatings. In particular, we will further explore the solutions to the problems of line edge roughness, mask distortions, wear-out of anti-adhesion layers, non-uniform mask pattern depth, and high-resolution electron-beam lithography (EBL) and misalignment of patterns. These new technologies to be developed in Phase-II will significantly improve NIL mask technology, lower its cost, and advance NIL processes for sub-45 nm nodes.

Principal Investigator:

Linshu Kong
Manager
7323551600
lkong@nanonex.com

Business Contact:

Larry Koecher
COO
7323551600
lkoecher@nanonex.com
Small Business Information at Submission:

NANONEX CORP.
1 Deer Park Drive Suite O Monmouth Junction, NJ 08852

EIN/Tax ID: 223672235
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No