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SBIR Phase I: Development of Innovative Nanoimprint Machines Based on…

Award Information

Agency:
National Science Foundation
Branch:
N/A
Award ID:
74857
Program Year/Program:
2005 / SBIR
Agency Tracking Number:
0512718
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Nanonex Corporation
1 DEERPARK DR STE O MONMOUTH JUNCTION, NJ 08852-1920
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Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 2005
Title: SBIR Phase I: Development of Innovative Nanoimprint Machines Based on Electrostatic-Force Assisted NIL (EFAN)
Agency: NSF
Contract: 0512718
Award Amount: $99,982.00
 

Abstract:

This Small Business Innovation Research (SBIR) Phase I research project will investigate the critical issues and feasibility of developing new Nano-Imprint Lithography (NIL) machines using an innovative approach in pressing a mold into the resist. The new approach, coined electrostatic force assisted NIL (EFAN) that uses an electrostatic force rather than mechanical forces or fluidic forces, can overcome many short-comings of the current pressing methods for NIL, offering a broad range of unique advantages, such as more precise alignment accuracy, better imprint uniformity, higher throughput, simpler machine design, and better machine reliability. The proposed research will significantly and broadly impact nano-manufacturing tools as well as nanotechnology product developments, and impact the next generation lithography tools for IC manufacturing.

Principal Investigator:

Wei Zhang
Dr
7323551600
weizhang@nanonex.com

Business Contact:

Larry Koecher
Mr
7323551600
lkoecher@nanonex.com
Small Business Information at Submission:

Nanonex
7 Foulet Drive Princeton, NJ 08540

EIN/Tax ID:
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No