Low Cost, Sub-32nm Hybrid Imprint & E-beam Template for Low-Volume Manufacturing
Agency / Branch:
DOD / DARPA
In order to diminish the second corollary of Moores Law (the cost of the manufacturing technology increases geometrically with time), Nanonex proposes the use of templates with gratings that can be manufactured at a low-cost by nanoimprint lithography (NIL). These templates are base wafers prefabricated and awaiting customization and can formed into the desired circuits by trimming or stitching these repetitive structures using EBL. The use of such templates will significantly reduce both costs and design cycles, and provide the basis for cost effective nano-scale electronics for niche applications. NIL is uniquely well suited for producing such templates.
Small Business Information at Submission:
1 Deer Park Drive Suite O Monmouth Junction, NJ 08852
Number of Employees: