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Low Cost, Sub-32nm Hybrid Imprint & E-beam Template for Low-Volume Manufacturing

Award Information

Agency:
Department of Defense
Branch:
Defense Advanced Research Projects Agency
Award ID:
91802
Program Year/Program:
2009 / SBIR
Agency Tracking Number:
08SB2-0708
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Nanonex Corporation
1 DEERPARK DR STE O MONMOUTH JUNCTION, NJ 08852-1920
View profile »
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 2009
Title: Low Cost, Sub-32nm Hybrid Imprint & E-beam Template for Low-Volume Manufacturing
Agency / Branch: DOD / DARPA
Contract: W31P4Q-09-C-0216
Award Amount: $98,984.00
 

Abstract:

In order to diminish the second corollary of Moores Law (the cost of the manufacturing technology increases geometrically with time), Nanonex proposes the use of templates with gratings that can be manufactured at a low-cost by nanoimprint lithography (NIL). These templates are base wafers prefabricated and awaiting customization and can formed into the desired circuits by trimming or stitching these repetitive structures using EBL. The use of such templates will significantly reduce both costs and design cycles, and provide the basis for cost effective nano-scale electronics for niche applications. NIL is uniquely well suited for producing such templates.

Principal Investigator:

Linshu Kong
Product Manager
7323551600
lkong@nanonex.com

Business Contact:

Larry Koecher
COO
7323551600
lkoecher@nanonex.com
Small Business Information at Submission:

NANONEX CORP.
1 Deer Park Drive Suite O Monmouth Junction, NJ 08852

EIN/Tax ID: 223672235
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No