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High Speed, High Accuracy Stage for Advanced Lithography

Award Information

Agency:
Department of Defense
Branch:
Defense Advanced Research Projects Agency
Award ID:
36506
Program Year/Program:
1997 / SBIR
Agency Tracking Number:
36506
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
OPTRA, Inc
461 Boston Street Topsfield, MA 01983-
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Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 1997
Title: High Speed, High Accuracy Stage for Advanced Lithography
Agency / Branch: DOD / DARPA
Contract: N/A
Award Amount: $98,906.00
 

Abstract:

The development of a high-speed, very accurate XY stage for semiconductor lithography is proposed. Key features are: a grid-based metrology system which is immune to turbulence and has subnanometer resolution; a high-speed, light-weight XY stage capable of supporting 12" wafers, and including active control of all six degrees of freedom; and dual-loop servo systems for X and Y to provide fast long-range moves and highly accurate short-range positioning. If successful, this approach will provide all of the capabilities needed for the next generation of steppers for high throughput, high accuracy microlithography. This approach also promises to reduce the cost of the metrology system by at least a factor of two relative to the cost of a comparable, but less capable, laser interferometer system.

Principal Investigator:

Michael Hercher
5088876600

Business Contact:

Small Business Information at Submission:

Optra, Inc.
461 Boston St. Topsfield, MA 01983

EIN/Tax ID:
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No