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PLASMAS

Award Information

Agency:
National Science Foundation
Branch:
N/A
Award ID:
1636
Program Year/Program:
1984 / SBIR
Agency Tracking Number:
1636
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Plasma Physics Corp
Po Box 548 Locust Valley, NY 11560
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Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 1984
Title: PLASMAS
Agency: NSF
Contract: N/A
Award Amount: $39,000.00
 

Abstract:

IN ORDER TO MEET THE ACCELERATING MARKET DEMAND FOR VLSI SEMI-CONDUCTOR MEMORY AND LOGIC CIRCUITS, IT APPEARS AS THOUGH MAGNETICALLY CONFINED PLASMAS ARE REQUIRED IN ORDER TO ATTAIN ANISOTROPIC ETCHING AT A HIGH RATE. CURRENT HIGH-PRESSURE PLASMA SYSTEMS ETCH WITH A HIGH RATE BUT WITH POOR FEATURE CONFORMATION, WHILE REACTIVE ION ETCHERS ETCH ANISOTROPICALLY, BUT SLOWLY. THE PROPOSED SYSTEM USES A MAGNETRON CONFINEMENT GEOMETRY DISCOVERED BY THE PROPOSER SEVERAL YEARS AGO ON A GAS DIODE PROJECT WHERE IT WAS OBSERVED THAT SPUTTERING OF THE DIODE CATHODE WAS UNIFORM AND RAPID. WE PROPOSE TO APPLY THIS GEOMETRY TO ETCH VLSIC WITH ONE MICRON FEATURE SIZES IN THE SURFACE OF SEMICONDUCTOR WAFERS. SUCCESSFUL COMPLETION OF THIS APPARATUS WOULD BENEFIT THE CIRCUIT DESIGNERS, ENABLING FABRICATION OF HIGHER-DENSITY MEMORY CIRCUITS AND THE COMPETITIVE POSITION WORLD-WIDE OF THE NATION'S ELECTRONIC INDUSTRY WHOSE PRODUCTS ARE LIMITED BY THE RESOLUTION OF ETCH FEATURES IN CHIPS.

Principal Investigator:

John h. coleman
PRESIDENT
0

Business Contact:

John H. Coleman
President
Small Business Information at Submission:

Plasma Physics Corpon
P.o. Box 548 Locust Valley, NY 11560

EIN/Tax ID:
DUNS: N/A
Number of Employees: N/A
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No