Advanced Heat Sink Materials for Fusion Energy Devices
Not Available We propose to construct a novel random phase mask that takes advantage of new gray-scale lithography to improve the performance of high throughput volumetric memories. The focus of the effort will be to produce a phase mask prototype during Phase I that can be integrated onto a Displaytech megapixel spatial light modulator to form an optical write head during Phase II. The proposed Phase II device would be capable of around 3 Gbit/sec throughput. Although this is much faster than the capacity of current recording media, its availability will remove another obstacle to constructing high performance volumetric memory systems and will spur the development of better recording media.
Small Business Information at Submission:
Plasma Processes, Inc.
4914 - D Moores Mill Road Huntsville, AL 35811
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