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RF ION SOURCE FOR REACTIVE ION BEAM ETCHING

Award Information

Agency:
National Science Foundation
Branch:
N/A
Award ID:
5246
Program Year/Program:
1987 / SBIR
Agency Tracking Number:
5246
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Pulse Sciences
14796 Wicks Blvd San Leandro, CA 94577
View profile »
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 1987
Title: RF ION SOURCE FOR REACTIVE ION BEAM ETCHING
Agency: NSF
Contract: N/A
Award Amount: $40,000.00
 

Abstract:

A VARIETY OF DRY ETCHING PROCESSES HAVE BEEN DEVELOPED FOR USE IN THE MANUFACTURE OF HIGH SPEED, HIGH DENSITY, INTEGRATED SEMICONDUCTOR CIRCUITS. THE RECENT REQUIREMENTS FOR SUBMICRON FEATURE DIMENSIONS HAVE PLACED STRESSING DEMANDS ON EXISTING TECHNOLOGIES SUCH AS REACTIVE ION ETCHING AND INERT ION BEAM ETCHING. REACTIVE ION BEAM ETCHING (RIBE) HAS RECENTLY BEEN DEMONSTRATED TO OFFER ADVANTAGES RELATIVE TO THESE TECHNOLOGIES BY FACILITATING RAPID ETCHING WITH HIGHLY PRECISE, SUBMICRON PATTERN DEFINITION. HOWEVER, AVAILABLE ION BEAM SOURCE DESIGNS INCORPORATE THERMIONIC ELECTRON EMITTERS WHICH ARE EASILY DAMAGED BY THE GASES USED IN RIBE PROCESSING. THIS RESULTS IN SHORT ION SOURCE LIFETIME, THEREBY GREATLY LIMITING THE PRACTICAL APPLICATION OF RIBE. PULSE SCIENCES, INC. PROPOSES TO OVERCOME THIS PROBLEM BY DEVELOPING AN INEXPENSIVE RADIO FREQUENCY (RF) ON SOURCE WHICH IS EXPECTED TO BE INSENSITIVE TO REACTIVE GASES AND THEIR PRODUCTS. AN EXPERIMENTAL, 20-30 CM, MAGNETIC-FIELD-FREE, RF ION SOURCE SYSTEM WILL BE CONSTRUCTED WHICH INCORPORATES A COLD CATHODE DISCHARGE IGNITER. PLASMA GENERATION EXPERIMENTS WILL BE PERFORMED WITH O2 AND CCL4 GASES AT RF FREQUENCIES UP TO 13.56 MHZ. ION EMISSION UNIFORMITY WILL BE MEASURED AND OPTIMIZED AT A CURRENT DENSITY OF APPROXIMATELY 1 MA/CM2 WITH THE GOAL OF ACHIEVING LESS THAN 5% VARIATION OVER THE CORE OF THE BEAM.

Principal Investigator:


0

Business Contact:

Dr. John R. Bayless
Director
Small Business Information at Submission:

Pulse Sciences Inc
5330 Derry Ave Suite J Agoura Hills, CA 91301

EIN/Tax ID:
DUNS: N/A
Number of Employees: N/A
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No