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SBIR Phase II: Novel Sensor for Control of Cleaning Processes During the…

Award Information

Agency:
National Science Foundation 		Branch:
N/A 		Award ID:
67979 		Program Year/Program:
2006 / SBIR
Agency Tracking Number:
0420158 		Solicitation Year:
N/A 		Solicitation Topic Code:
N/A 		Solicitation Number:
N/A
Small Business Information
Ridgetop Group, Inc.
6595 North Oracle Road Tucson, AZ -
View profile »
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 2
Fiscal Year: 2006
Title: SBIR Phase II: Novel Sensor for Control of Cleaning Processes During the Fabrication of Microstructures
Agency: NSF
Contract: 0548743
Award Amount: $470,050.00
 

Abstract:

This Small Business Innovation Research (SBIR) Phase II project provides a unique and robust in-situ sensor for detection and control of impurities in microstructures and porous layers associated with manufacturing of semiconductor, MEMS, and emerging nanodevices. Use of impedance as a measure of contamination in bulk fluids is well established. However, applying it in micro-scale features is novel and has many promising applications. The proposed Electro-Chemical Residue Sensor (ECSR) technology is not aimed at developing yet another sensor to measure contaminants in fluids. It is rather aimed at the in-situ, real-time, and low-cost measurement of residual contamination inside and on the sidewalls of micro- and nano- features (the bottlenecks of cleaning, rinsing, and drying). The Phase II proposed plan is to design, fabricate, and test a prototype sensor assembly and develop its interface with process tools for cleaning, rinsing, and drying of micro-features. The first planned application, amounting to annual commercial market revenue of $9M to $30M, will be in rinsing and drying of patterned wafers and porous films in micro-electronics manufacturing. Currently, these operations are often run with no adequate real-time control. Insufficient cleaning and drying have significant negative impact on manufacturing yields and device performance. On the other hand, excessive cleaning and drying results in damage to the micro-structures, increase in cost, and wasting of chemicals, water, and energy. The application of the ECRS technology to wafer rinsing alone is expected to reduce water usage by 40-60%.

Principal Investigator:

Bert Vermeire
Mr
5207423300
bert@eng-metrology.com

Business Contact:

Farhang Shadman
Mr
5207423300
shadman@env-metrology.com
Small Business Information at Submission:

EMC
6595 North Oracle Road Suite 153B Tucson, AZ 85704

EIN/Tax ID:
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No