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Sandia Systems, Inc.

Company Information
Address
2655 A Pan American Freeway Ne
Albuquerque, NM 87107
United States



Information

UEI: N/A

# of Employees: 4


Ownership Information

HUBZone Owned: No

Socially and Economically Disadvantaged: No

Woman Owned: No



Award Charts




Award Listing

  1. Post Exposure Bake Monitoring of Chemically Amplified Resists Using Scatterometry

    Amount: $100,946.00

    We will demonstrate the capability of scatterometry to provide a process monitor to post exposure bake of chemically amplified photoresist. Two or more scatterometers will be designed that are capable ...

    SBIRPhase I1994Department of Defense Defense Advanced Research Projects Agency
  2. Automated Defect Analysis Using a Doma Scatterometer and Image Analysis

    Amount: $63,881.00

    We will model the optical scatter produced by different shapes and concentrations of defects using scalar diffraction theory. We will develop image processing techniques which can be used to supply fe ...

    SBIRPhase I1993Department of Defense Air Force
  3. Thin-Shell Replication of Grazing Incidence Silicon-Carbide Mirrors

    Amount: $49,609.00

    N/A

    SBIRPhase I1993National Aeronautics and Space Administration
  4. AUTOMATED, DETERMINISTIC ASPHERE FABRICATION

    Amount: $499,237.00

    IN THIS PROJECT, ION-BEAM-FIGURING TECHNIQUES WILL BE APPLIED TO FIGURE ASPHERIC OPTICAL ELEMENTS. A LENS WILL BE CORRECTED FOR 5TH-ORDER ABERRATIONS AS A DEMONSTRATION. SIMULATED ION-BEAM FIGURING OF ...

    SBIRPhase II1992National Aeronautics and Space Administration
  5. AUTOMATED, RAPID FABRICATION OF COMPLEX OPTICAL COMPONENTS

    Amount: $49,932.00

    ION BEAM FIGURING TECHNIQUES WILL BE APPLIED TO FIGURE ASPHERE OPTICAL ELEMENTS. A MIRROR WILL BE ASPHERIZED TO REMOVE THE R(0)6 ZERNIKE CONTRIBUTION TO CORRECT FOR THIRD-ORDER AND FIFTH-ORDER SPHERIC ...

    SBIRPhase I1992National Science Foundation
  6. OVERLAY AND GRATING LINESHAPE METROLOGY USING OPTICAL SCATTEROMETRY

    Amount: $58,955.00

    IN MICROELECTRONICS PROCESSING DIFFRACTION GRATING TEST PATTERNS ARE CREATED ON THE WAFER FOR CHARACTERIZING A PROCESS STEP. IN THIS APPLICATION THE SHAPE OF THE LINE IS MEASURED SINCE IT IS DETERMINE ...

    SBIRPhase I1992Department of Defense Defense Advanced Research Projects Agency
  7. Rapid Fabrication of Precise SiC Mirror Substrates

    Amount: $55,861.00

    Sandia Systems, Inc. will apply novel processing techniques to demonstrate an improved fabrication process for SiC optical elements. We will combine the CVD of SiC replication process and ion beam fig ...

    SBIRPhase I1992Department of Defense Missile Defense Agency
  8. AUTOMATED, DETERMINISTIC ASPHERE FABRICATION

    Amount: $49,976.00

    N/A

    SBIRPhase I1991National Aeronautics and Space Administration
  9. ION BEAM PROCESSING ZNSE

    Amount: $58,533.00

    ION BEAMS WILL BE APPLIED IN SEVERAL ASPECTS OF PROCESSING ZNSE OPTICAL COMPONENTS. FIRST THE MATERIAL WILL BE MILLED, AND THEN IT WILL BE COATED USING ION ASSISTED DEPOSITION TECHNIQUES. REDUCED SCAT ...

    SBIRPhase I1990Department of Defense Air Force
  10. OPTICAL CHARACTERIZATION TECHNIQUES FOR SOI MATERIAL

    Amount: $210,555.00

    PRESENT TECHNIQUES OF EXAMING RECRYSTALLIZED SILICON, INCLUDING SOI MATERIAL, INCLUDE A WET (ACID) ETCH AND EXAMINATION WITH AN OPTICAL MICROSCOPE, X-RAY DIFFRACTION, SEM OR TEM MICROSCOPES. THESE TEC ...

    SBIRPhase II1989National Science Foundation
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