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High Performance, Compact Capacitors for Pulse Forming Networks

Award Information

Agency:
Department of Defense
Branch:
Air Force
Award ID:
82136
Program Year/Program:
2008 / SBIR
Agency Tracking Number:
F071-178-3040
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
SIGMA TECHNOLOGIES INTL, INC.
10960 N Stallard Place Tucson, AZ 85737-9527
View profile »
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 2
Fiscal Year: 2008
Title: High Performance, Compact Capacitors for Pulse Forming Networks
Agency / Branch: DOD / USAF
Contract: FA8650-08-C-2857
Award Amount: $750,000.00
 

Abstract:

This project addresses the development of a solid state polymer multilayer capacitor composed of thousands of nano-thick dielectric layers and self healing aluminum electrodes. Unlike conventional self supported polymer capacitor films that have limited polymer chemistries and dielectric thickness, the proposed capacitor system makes use of a family of highly cross linked amorphous polymer dielectrics, that have dielectric constants in the range of ?=2.5-13, breakdown strength >1000V/?m and are integrated with aluminum electrodes into a capacitor using a non contact process, in an environment free of particulate contaminants. This results in defect free polymer dielectrics that have low dielectric absorption due to their amorphous character, and breakdown strength higher than any self supported film dielectric due to the combination of the intrinsic polymer properties and their submicron thickness. In the phase I work the main focus of the effort was to develop a "layer isolation process" in order to elevate the energy density of these polymer multilayer capacitors. The results show that single layer small area capacitors were produced with energy densities as high as 11.5J/cc, which is typical for submicron thick acrylate polymer dielectrics. Multilayer capacitors with 1200 capacitor layers that were "partially processed" for layer isolation, exhibited energy densities as high as 3.4J/cc. The Phase II work will be designed to complete and optimize the layer isolation process in order to further increase the capacitor energy density. Capacitors with different dielectric constants and dielectric thickness will be produced and will be tested for basic capacitor properties including energy dencity, dissipation factor and capacitance at different temperatures and dV/dt discharge characteristics.

Principal Investigator:

Angelo Yializis
President
5205758013
ayializis@sigmalabs.com

Business Contact:

Doris Dziomba
Executive Secretary
5205758013
ddziomba@sigmalabs.com
Small Business Information at Submission:

SIGMA TECHNOLOGIES INTL, INC.
10960 N. Stallard Place Tucson, AZ 85737

EIN/Tax ID: 860700419
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No