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FABRICATION OF HIGH ASPECT RATIO Cu AND BRASS NANOFLAKES FOR IR OBSCURANT…

Award Information

Agency:
Department of Defense
Branch:
Army
Award ID:
87036
Program Year/Program:
2008 / SBIR
Agency Tracking Number:
A072-121-0196
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
SIGMA TECHNOLOGIES INTL, INC.
10960 N Stallard Place Tucson, AZ 85737-9527
View profile »
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 2
Fiscal Year: 2008
Title: FABRICATION OF HIGH ASPECT RATIO Cu AND BRASS NANOFLAKES FOR IR OBSCURANT APPLICATIONS
Agency / Branch: DOD / ARMY
Contract: W911SR-09-C-0011
Award Amount: $725,027.00
 

Abstract:

The US Army is seeking to develop an IR obscurant material for military operations and high aspect ratio, conductive, metallic nanoflake (HANF) is under consideration. Conductive nanoflakes have been demonstrated to be excellent screeners of IR when used in advanced countermeasure devices such as smoke grenades or smoke pots. The primary objective of the Phase II effort is to further develop and scale up the conductive nanoflake fabrication process successfully demonstrated during Phase I and produce about 25kg of brass and copper nanoflake using a commercially viable process.

Principal Investigator:

Richard Ellwanger
Senior Scientist
5205758013
ree@sigmalabs.com

Business Contact:

Angelo Yializis
President
5205758013
ayializis@sigmalabs.com
Small Business Information at Submission:

SIGMA TECHNOLOGIES INTL, INC.
10960 N. Stallard Place Tucson, AZ 85737

EIN/Tax ID: 860700419
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No