POWER WASH: Polishing the microchips that power clean-energy technologyAs Earth’s population grows, the global demand for energy is predicted to rise, and with no immediate end in sight. By 2040, the world’s energy consumption will increase by 56 percent, according to a 2013 report by...
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Sinmat Inc
Company Information
Information
UEI: N/A
# of Employees: 20
Ownership Information
HUBZone Owned: No
Socially and Economically Disadvantaged: No
Woman Owned: No
Award Charts
Award Listing
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Reduced-Cost Grinding and Polishing of Large Sapphire Windows
Amount: $79,994.00Sinmat Inc., in collaboration with Exotic Electro-Optics, Inc. proposes to investigate grinding and polishing of large sapphire windows using slurries based on unique nanoporous silica particles. Due ...
SBIRPhase I2012Department of Defense Navy -
Novel Polishing Process to Fabricate Ultra Low Thickness Variation Diamond Substrates for Next Generation Beam Tracking Detectors
Amount: $150,000.00Diamond crystals with small total thickness variation (TTV) and local thickness variation (LTV) values are needed for position sensitive fast particle detectors for particle tracking/timing, and detec ...
SBIRPhase I2011Department of Energy -
Low Cost, Scalable Manufacturing of Microlens Engineered Substrates (MLES) for Enhanced Light Extraction in OLED Devices
Amount: $749,991.00Solid state lighting is being promoted as the ultimate lamps of future. Though the internal quantum efficiency of OLED devices is almost 100%, external efficiency is a mere 36% mainly because of poor ...
STTRPhase II2011Department of Energy -
Defect Free, Ultra-Rapid Thinning/Polishing of Diamond Crystal Radiator Targets (20??m) for Highly Linearly Polarized Photon Beams
Amount: $749,973.00The fabrication of high-quality ultra thin (~20 micron) diamond crystals targets for 9 GeV highly polarized photon beams is an outstanding challenge. Current state of the art polishing/thinning techni ...
STTRPhase II2011Department of Energy -
Production of Reduced Defect Density (112) Silicon Wafers Utilizing Ultra- Gentle, Chemical Mechanical Smoothening (CMS) Process
Amount: $98,658.00As the epi quality of HgCdTe layers is dependent on the quality of silicon surfaces, it is imperative that the (112) Si surfaces be pristine and devoid of defects. Unfortunately, the commercial availa ...
SBIRPhase I2011Department of Defense Army -
Contamination-free, Ultra-rapid Reactive Chemical Mechanical Polishing (RCMP) of GaN substrates
Amount: $100,000.00Gallium Nitride (GaN) substrates are ideal materials for fabrication of high-power and high-frequency devices based on III-V materials. The current state-of-the-art Chemical Mechanical Polishing (CMP) ...
STTRPhase I2010Department of Defense Missile Defense Agency -
Low Cost, Scalable Manufacturing of Microlens Engineered Substrates (MLES) for Enhanced Light Extraction in OLED Devices
Amount: $99,997.00Solid state lighting is being promoted as the ultimate lamps of future. Though the internal quantum efficiency of OLED devices is almost 100%, external efficiency is a mere 36% mainly because of poor ...
STTRPhase I2010Department of Energy -
Defect Free, Ultra-Rapid Thinning/Polishing of Diamond Crystal Radiator Targets (20??m) for Highly Linearly Polarized Photon Beams
Amount: $99,997.00The fabrication of high-quality ultra thin (~20 micron) diamond crystals targets for 9 GeV highly polarized photon beams is an outstanding challenge. Current state of the art polishing/thinning techni ...
STTRPhase I2010Department of Energy -
Novel Reactive Chemical Mechanical Polishing (RCMP) Technology for fabrication of Large, Non-flat SiC mirrors
Amount: $100,000.00Silicon Carbide (SiC) due to its superior thermal and mechanical properties serves as an attractive candidate as mirror material. The manufacturing of such mirrors is a critical challenge because of t ...
SBIRPhase I2010Department of Defense Missile Defense Agency -
Ultra-Rapid Chemical Mechanical Finishing (UCMF) of SiC Mirrors
Amount: $799,994.00The overall goal of the Phase II effort is to develop the novel ultra-rapid chemical mechanical finishing (UCMF) process for SiC mirror manufacturing, and commercialize this process in collaboration w ...
SBIRPhase II2010Department of Defense Missile Defense Agency
