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SBIR Phase I: Chemical Vapor Deposition Tool for Device Grade SiC Epilayers

Award Information

Agency:
National Science Foundation
Branch:
N/A
Award ID:
79627
Program Year/Program:
2006 / SBIR
Agency Tracking Number:
0539738
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Structured Materials Industries
201 Circle Drive North Unit # 102 Piscataway, NJ 08854-3723
View profile »
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 2006
Title: SBIR Phase I: Chemical Vapor Deposition Tool for Device Grade SiC Epilayers
Agency: NSF
Contract: 0539738
Award Amount: $100,000.00
 

Abstract:

This Small Business Innovation Research (SBIR) Phase I project will result in a high throughput, large area, Chemical Vapor Deposition (CVD) tool for the production of device grade SiC epitaxial films and substrates. This proposal will develop, test and implement the technology. Silicon carbide (SiC) is a wide band gap material that is the proven key enabler of the next-generation high power, high-frequency and radiation hard device applications succeeding silicon and gallium arsenide. Due to its unique materials and electronic properties, SiC devices can function under higher power ratings as well as higher frequency and temperatures compared to Si and GaAs products. For that reason, these high performance devices are intensely sought after for both commercial and military device applications. To date, however, its commercial potential has been limited by a lack of production capacity for large area, device grade epitaxial films and substrates. The proposed work will address the current materials limitations of SiC epitaxial process technology through enhanced processing capabilities. The unique materials properties of Silicon Carbide allow the material to be used in high performance devices for applications that require high power, high frequency or high temperature. Such devices are under development for lighting, consumer electronics, industrial electronics and the automotive industry for example. SiC devices will also find use in industrial motors and power supplies requiring high voltage. In addition to performance benefits, SiC offers significant cost saving opportunities by eliminating expensive cooling systems needed in a range of industrial equipment common to factories worldwide. However, development has been hampered by a lack of inexpensive, high quality SiC substrate material.

Principal Investigator:

Edwin M. Dons
Dr
7323029274
edons@structuredmaterials.com

Business Contact:

Gary S. Tompa
Mr
7323029274
gstompa@aol.com
Small Business Information at Submission:

SMI
201 Circle Drive Piscataway, NJ 08854

EIN/Tax ID:
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No