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SIMULTANEOUS SPUTTER-DEPOSITION/ION-IMPLAN- TATION PROCESS.

Award Information

Agency:
Department of Energy
Branch:
N/A
Award ID:
2485
Program Year/Program:
1985 / SBIR
Agency Tracking Number:
2485
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
SPIRE CORPORATION
1 PATRIOTS PARK BEDFORD, MA 01730-2396
View profile »
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 1985
Title: SIMULTANEOUS SPUTTER-DEPOSITION/ION-IMPLAN- TATION PROCESS.
Agency: DOE
Contract: N/A
Award Amount: $49,991.00
 

Abstract:

THE USE OF ION BEAMS AS A MEANS OF ENHANCING THE PROPERTIES OF DEPOSITED THIN FILMS HAS ATTRACTED CON- SIDERABLE INTEREST IN THE LAST FEW YEARS. FURTHER DEVELOPMENT OF ENERGETICALLY-ENHANCED, ION-DEPOS- TION TECHNIQUES IS EXPECTED TO RESULT IN A NEW GENERATION OF EXOTIC COATINGS WITH NEAR-THEORETICAL DENSITIES, VERY HIGH HARDNESS, AND, AT THE SAME TIME, A CAPACITY OF SELF-LUBRICATION. DEVELOPMENT OF A SIMULTANEOUS SPUTTER-COATING, ION-IMPLANTATION TECHNIQUE IS PLANNED FOR CREATION OF DIAMOND-LIKE THIN FILMS WITH EXCELLENT ADHESION AND PARAMETERS CLOSE TO THOSE OF THE BULK MATERIAL. IN THIS APPROACH, A THIN LAYER OF MATERIAL (FOR EXAMPLE, BORON) IS ION- SPUTTERED ONTO A SURFACE THAT IS CONCURRENTLY IM- PLANTED WITH A STEADY BEAM OF IONS (FOR EXAMPLE, NOTROGEN). THE COATINGS SYNTHESIZED BY THIS TECHNIQUE (FOR EXAMPLE, I-BN) ARE EXPECTED NOT ONLY TO BE EXTREMELY HARD AND WEAR-RESISTANT BUT TO TRANSFORM TO A SELF-LUBRICATING FORM UNDER LOAD. THIS TECHNIQUE IS EXPECTED TO BE USEFUL FOR DEPOSITION OF DIAMOND- LIKE COATINGS SUCH AS I-CARBON AND I-BORON NITRIDE AND ALSO SUCH REFRACTORY MATERIALS AS B4C, TIN, TIC AND TIB2.

Principal Investigator:

Dr. piran sioshansi
PRINCIPAL INVESTIGATOR
6172756000

Business Contact:

Small Business Information at Submission:

Spire Corp
Patriots Park Bedford, MA 02173

EIN/Tax ID:
DUNS: N/A
Number of Employees: N/A
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No