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THE USE OF ION BEAMS AS A MEANS OF ENHANCING THE PROPERTIES OF DEPOSITED THIN…

Award Information

Agency:
National Science Foundation
Branch:
N/A
Award ID:
2698
Program Year/Program:
1985 / SBIR
Agency Tracking Number:
2698
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Spire Corporation
One Patriots Park Bedford, MA 01730-2396
View profile »
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 1985
Title: THE USE OF ION BEAMS AS A MEANS OF ENHANCING THE PROPERTIES OF DEPOSITED THIN FILMS HAS ATTRACTED CONSIDERABLE INTEREST IN THE LAST FEW YEARS.
Agency: NSF
Contract: N/A
Award Amount: $40,000.00
 

Abstract:

THE USE OF ION BEAMS AS A MEANS OF ENHANCING THE PROPERTIES OF DEPOSITED THIN FILMS HAS ATTRACTED CONSIDERABLE INTEREST IN THE LAST FEW YEARS. THE FURTHER DEVELOPMENT OF ENERGETICALLY-ENHANCED ION DEPOSITION TECHNIQUES IS EXPECTEDTO RESULT IN A NEW GENERATION OF EXOTIC COATINGS WITH SUPERIOR ADHESION, NEAR-THEORETICAL DENSITIES, VERY HIGH HARDNESS, AND, AT THE SAME TIME, CAPABLE OF BEING DEPOSITED AT LOW TEMPERATURE. SPIRE CORPORATION PROSES TO DEVELOP A ION BEAM ENHANCED DEPOSITION TECHNIQUE FOR CREATION OF A SUPER ADHERENT HARD COATING OF TIN AND HFN. IN THIS APPROACH A THIN LAYER OF MATERIAL (E.G., TI OR HF) IS SPUTTERED ONTO A SURFACE AND CONCURENTLY BOMBARDED WITH A STEADY BEAM OF IONS (E.G. NITROGEN). COATINGS PRODUCED BY THIS NOVEL TECHNIQUE PROMISE SUPERIOR WEAR RESISTANCE AND ADHESION AT LOW PROCESSING TEMPERATURES THUS AVOIDING DISTORTION OF PRECISION OR INTRICATE COMPONENTS.

Principal Investigator:

James k hirvonen
SENIOR SCIENTIST
6172756000

Business Contact:

Small Business Information at Submission:

Spire Corp
Patriots Pk Bedford, MA 01730

EIN/Tax ID:
DUNS: N/A
Number of Employees: N/A
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No