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DEPOSITION OF METASTABLE THIN FILM MATERIALS BY LIGHT-ASSISTED METALORGANIC…

Award Information

Agency:
Department of Energy
Branch:
N/A
Award ID:
7052
Program Year/Program:
1987 / SBIR
Agency Tracking Number:
7052
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
SPIRE CORPORATION
1 PATRIOTS PARK BEDFORD, MA 01730-2396
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Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 1987
Title: DEPOSITION OF METASTABLE THIN FILM MATERIALS BY LIGHT-ASSISTED METALORGANIC CHEMICAL VAPOR DEPOSITION
Agency: DOE
Contract: N/A
Award Amount: $49,821.00
 

Abstract:

IT IS PLANNED TO GROW METASTABLE SEMICONDUCTING PHASES, INCLUDING ALPHA-TIN AND CUBIC TIN-GERMANIUM ALLOYS BY LIGHT-ASSISTED METALORGANIC CHEMICAL VAPOR DEPOSITION. PRECURSORS SUCH AS TETRAMETHYL TIN, GERMANE, OR TETRAMETHYL GERMANIUM WILL BE INTRODUCED INTO A REACTOR. AS THE GASES FLOW PAST THE SUBSTRATE, ULTRAVIOLET LIGHT WILL ILLUMINATE THEM THROUGH A QUARTZ WINDOW, AND THE PHOTOLYSIS WILL GENERATE FREE RADICALS THAT WILL DEPOSIT ON THE SUBSTRATE. THE USE OF LIGHT TO DISSOCIATE THE GAS MOLECULES WILL ALLOW EPITAXY TO BE CARRIED OUT AT A LOWER TEMPERATURE THAN WOULD NORMALLY BE THE CASE FOR CHEMICAL VAPOR DEPOSITION. THIS LOWER TEMPERATURE MAY BE CRUCIAL FOR MAINTAINING METASTABLE MATERIALS IN THE DESIRED PHASES. IN PHASE I, THE PHOTOLYSIS OF VARIOUS METALORGANIC COMPOUNDSWILL BE INVESTIGATED TO ESTABLISH THE FEASIBILITY OF THE PROCESS. THE INFLUENCE OF LIGHT INTENSITY, SUBSTRATE TEMPERATURE, AND OTHER VARIABLES WILL BE ESTABLISHED. IF PHOTOLYSIS AND DEPOSITION OF METALS FROM THESE COMPOUNDS IS SUCCESSFUL, PHASE II WILL BE CONCERNED WITH ESTABLISHING THE CONDITIONS NEEDED FOR EPITAXIAL GROWTH.

Principal Investigator:

Mr christopher keavney
6172756000

Business Contact:

Small Business Information at Submission:

Spire Corp
Patriots Park Bedford, MA 01730

EIN/Tax ID:
DUNS: N/A
Number of Employees: N/A
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No