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RADIATION-TOLERANT MEMBRANES FOR X-RAY LITHOGRAPHY MASKS

Award Information

Agency:
National Science Foundation
Branch:
N/A
Award ID:
14412
Program Year/Program:
1991 / SBIR
Agency Tracking Number:
14412
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
SPIRE CORPORATION
1 PATRIOTS PARK BEDFORD, MA 01730-2396
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Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 1991
Title: RADIATION-TOLERANT MEMBRANES FOR X-RAY LITHOGRAPHY MASKS
Agency: NSF
Contract: N/A
Award Amount: $49,877.00
 

Abstract:

X-RAY LITHOGRAPHY (XRL) REQUIRES A MASK MEMBRANE MATERIAL WHICH IS STRONG, STABLE, RADIATION RESISTANT, AND EASY TO USE IN XRL SYSTEMS. IN EUROPEAN AND JAPANESE PROGRAMS, SILICON CARBIDE MEMBRANES AND COMPLETE MASKS HAVE BEEN PREPARED, TESTED, AND SHOWN TO CONFIRM THE PERFORMANCE EXPECTATIONS FOR THIS MATERIAL. NO U.S. COMPANY HAS A CAPABILITY TO MANUFACTURE SIC XRL MASKS; THE U.S. CLEARLY LAGS BEHIND EUROPE AND JAPAN IN THIS TECHNOLOGY. IN EUROPE AND JAPAN, ORDINARY CHEMICAL VAPOR DEPOSITION AT HIGH AND LOW PRESSURES (CVD AND LPCVD) HAS BEEN USED BUT THESE PROCESSES ARE NEITHER AS CONVENIENT NOR AS FLEXIBLE AS SOME OTHERS WHICH MAY ALSO BE SUITABLE. THE PROPOSED PROJECT WILL PRODUCE SIC MEMBRANES BY THREE DIFFERENT METHODS: RF SPUTTERING; PLASMA ACTIVATED CHEMICAL VAPOR DEPOSITION (PACVD); AND ION BEAM ASSISTED DEPOSITION (IBAD). THICKNESS, STRESS, STRENGTH, AND PRELIMINARY RADIATION STABILITY MEASUREMENTS WILL BE MADE DURING PHASE I. DATA OBTAINED THROUGH PHASE I EFFORTS WILL BE USED IN SELECTING THE PROCESSES AND METHODS TO BE DEVELOPED DURING PHASE II.

Principal Investigator:

Ward Halverson
Sc.d. Director
0

Business Contact:

Small Business Information at Submission:

Spire Corp
Patriots Park Bedford, MA 01730

EIN/Tax ID:
DUNS: N/A
Number of Employees: N/A
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No