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ATOMIC LAYER EPITAXY OF III-V COMPOUNDS FOR REPRODUCIBLE MULTILAYER…

Award Information

Agency:
Department of Defense
Branch:
Defense Advanced Research Projects Agency
Award ID:
15250
Program Year/Program:
1991 / SBIR
Agency Tracking Number:
15250
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Spire Corporation
One Patriots Park Bedford, MA 01730-2396
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Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 1991
Title: ATOMIC LAYER EPITAXY OF III-V COMPOUNDS FOR REPRODUCIBLE MULTILAYER NANOSTRUCTURES
Agency / Branch: DOD / DARPA
Contract: N/A
Award Amount: $61,161.00
 

Abstract:

THE PROPOSED RESEARCH PROGRAM WILL COUPLE ATOMICLAYER EPITAXY (ALE) WITH CONVENTIONAL METALORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) MULTILAYERED DEVICE STRUCTURES WITH ULTRA-THIN (20-2500 A) FEATURES. THE BENEFIT OF THIS WILL BE HIGHER THROUGHPUT, YIELD AND REPRODUCIBILITY THAN CAN BE OBTAINED BY ALE ALONE. ALE IS ESPECIALLY SUITED FOR THE DEPOSITION OF ULTRA-THIN FILMS, OFFERING EXCELLENT UNIFORMITY AND THICKNESS CONTROL IN A SELF-LIMITING MANNER. A HYBRID DEPOSITION SCHEME WHICH COMBINES ALE AND CONVENTIONAL MOCVD DEPOSITION WILL BE UTILIZED TO GROW QUANTUM WELL (QW) LASER STRUCTURES IN THE A1GAAS/GAAS SYSTEM. THE GOAL OF PHASE I WILL BE TO ESTABLISH DEPOSITION PARAMETERS FOR ALE OF GAAS/A1GAAS IN A LARGE-SCALE, MULTIPLE WAFER MOCVD SYSTEM. A SECOND OBJECTIVE WILL BE TO DEMONSTRATE FEASIBILITY OF THE HYBRID DEPOSITION SCHEME, WHERE THE ACTIVE GAAS-A1GAAS INTERFACES OFA QW LASER WILL BE DEPOSITED BY ALE AND THE REST OF THE STRUCTURE BY CONVENTIONAL MOCVD. PHASE II WILL SEEK TO OPTIMIZE MO-ALE DEPOSITION PARAMETERS AND DEVICE STRUCTURES (QW LASER AND HBTS) FOR EXCELLENT UNIFORMITY, REPRODUCIBILITY AND LOWER COST. REACTOR DEVELOPMENT WILL BE INCLUDED AS PART OF THE MO-ALE OPTIMIZATION PROCESS FOR HIGHER YIELD WITHOUT COMPROMISING REACTOR THROUGHPUT. ANTICIPATED BENEFITS/POTENTIAL COMMERCIAL APPLICATIONS - THE SUCCESSFUL COMPLETION OF PHASES I ANDII WILL PROVIDE A RELIABLE PROCESS FOR GAAS/A1GAAS MULTILAYER STRUCTURES, SUCH AS QW LASERS AND HBTS, WITH EXCELLENT CONTROL OVER WELL THICKNESS, GOOD REPRODUCILITY, AND HIGH YIELD. MOREVOER, THESE RESEARCH EFFORTS WILL LEAD TO THE DEVELOPMENT OF A NEW GENERATION OF REACTORS CAPABLE OF LARGE AREA DEPOSITION WIHT PRECISE CONTROL OVER FILM THICKNESS, AND COMPOSITION.

Principal Investigator:

Nasser Karam
Principal Investigator
6172756000

Business Contact:

Small Business Information at Submission:

Spire Corp
One Patriots Park Bedford, MA 01730

EIN/Tax ID:
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No