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Epitaxial MOCVD of Thin Film Ceramics for Pyroelectric Detectors

Award Information

Agency:
Department of Defense
Branch:
Army
Award ID:
20670
Program Year/Program:
1993 / SBIR
Agency Tracking Number:
20670
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Spire Corporation
One Patriots Park Bedford, MA 01730-2396
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Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 1993
Title: Epitaxial MOCVD of Thin Film Ceramics for Pyroelectric Detectors
Agency / Branch: DOD / ARMY
Contract: N/A
Award Amount: $49,940.00
 

Abstract:

Spire proposes to deposit very thin films of lead-titanate by Metal Organic Chemical Vapor Deposition (MOCVD) for use as pyroelectric detectors. A multilayer structure will be fabricated to create an epitaxial, thermally isolated detector element with higher sensitivity than that of the thick films presently being used. MOCVD is an innovative technique which allows sequential heteroepitaxial growth of electrical and thermal insulators, electrically conducting layers, and pyroelectric materials. In Phase I, Spire will use its unique capabilities to deposit (metal)/PbTiO3/CoSi2 on silicon and will measure lead titanate's pyroelectric coefficient. Prototype infrared sensors with integrated FET's would be fabricated in Phase II. Integrated pyroelectric detector arrays made possible by this technology would have greater sensitivity and resolution arrays produced by existing hybrid fabrication processes.

Principal Investigator:

Anton C. Greenwald, Ph.d.
6172756000

Business Contact:

Small Business Information at Submission:

Spire Corp.
One Patriots Park Bedford, MA 01730

EIN/Tax ID:
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No