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MICROCHANNEL PLATES FABRICATED BY TRACK ETCH LITHOGRAPHY

Award Information

Agency:
Department of Energy
Branch:
N/A
Award ID:
27312
Program Year/Program:
1994 / SBIR
Agency Tracking Number:
27312
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
SPIRE CORPORATION
1 PATRIOTS PARK BEDFORD, MA 01730-2396
View profile »
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 1994
Title: MICROCHANNEL PLATES FABRICATED BY TRACK ETCH LITHOGRAPHY
Agency: DOE
Contract: N/A
Award Amount: $74,981.00
 

Abstract:

TINY CHANNELS CAN BE FORMED IN POLYMERS AND GLASS BY CHEMICAL ETCHING ALONG COLUMNS OF RADIATION DAMAGE CREATED BY ALPHA PARTICLE BOMBARDMENT THROUGH MICROSCOPIC HOLES IN A DENSE MASK. THE OBJECTIVE OF PHASE I RESEARCH IS TO DETERMINE WHETHER A DENSE PACKING OF THESE CHANNELS, CARRIED THROUGH THE IRRADIATED SUBSTRATE, CAN RELIABLY FORM MICRO CHANNEL PLATES (MCP) SUITABLE FOR AMPLIFIEERS FOR IMAGERS AND OTHER OPTOELECTRONIC DEVICES. THE REDUCTION IN CHANNEL DIAMETERS COMPARED TO THOSE CHARACTERISTICS OF DRAWN GLASS-FIBERS WILL PRESERVE GAIN AND EFFICIENCY WHILE IMPROVING SPATIAL RESOLUTION AND RESPONSE TIME. MOST SIGNIFICANTLY, THIS WILL GREATLY REDUCE COSTS THROUGH A SIMPLE TWO-STEP PROCESS SIMILAR TO PHOTOLITHOGRAPHY WHERE HOLES IN A MASK ARE POSITIONED TO OPTIMIZE CHANNEL LOCATIONS. PHASE II WOULD USE THIS DEEP ION-DAMAGE ETCHING PROCESS TO MAKE LARGE PLATES WITH IDENTICAL CHANNEL LOCATIONS, PROVIDING HIGH REGISTRATION EFFICIENCY OVER LARGE AREAS AND FURTHER IMPROVING THE RESOLUTION OF FINISHES DEVICES.

Principal Investigator:

Dr Charles C Blatchley
6172756000

Business Contact:

Small Business Information at Submission:

Spire Corp.
1 Patriots Pk Bedford, MA 01730

EIN/Tax ID:
DUNS: N/A
Number of Employees: N/A
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No