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Low Cost Nanolithography Techniques Using Elastomer Shrinkage and/or Plasmon…

Award Information

Agency:
Department of Defense
Branch:
Defense Advanced Research Projects Agency
Award ID:
68865
Program Year/Program:
2004 / SBIR
Agency Tracking Number:
04SB3-0248
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Tanner Research, Inc.
825 S. Myrtle Ave. Monrovia, CA 91016-
View profile »
Woman-Owned: Yes
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 2004
Title: Low Cost Nanolithography Techniques Using Elastomer Shrinkage and/or Plasmon Confinement
Agency / Branch: DOD / DARPA
Contract: W31P4Q-05-C-R068
Award Amount: $98,990.00
 

Abstract:

Nanolithography remains the critical hurdle in developing and commercializing new nanotechnology devices. A low cost nanolithography technique must be developed if the promise of nanotechnology is to be fully realized. Tanner Research and Stanford University are proposing two new nanolithography techniques based on elastomer shrinkage and plasmon confinement. Both of these techniques will be pursued in parallel during Phase I wherein we will demonstrate the proof of concept for lithography at 35-40 nm feature sizes, mitigate the associated risk areas, and develop specific applications for the two techniques.

Principal Investigator:

Ravi Verma
Scientist
6267923000
ravi.verma@tanner.com

Business Contact:

Kevin Dinniene
Controller
6267923000
kevin@tanner.com
Small Business Information at Submission:

TANNER RESEARCH, INC.
2650 East Foothill Boulevard Pasadena, CA 91107

EIN/Tax ID: 954163780
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No