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Non-contact lithography based on optical superlensing at 193 nm

Award Information

Agency:
Department of Defense
Branch:
Defense Advanced Research Projects Agency
Award ID:
86300
Program Year/Program:
2008 / SBIR
Agency Tracking Number:
07SB2-0421
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Tanner Research, Inc.
825 S. Myrtle Ave. Monrovia, CA 91016-
View profile »
Woman-Owned: Yes
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 2008
Title: Non-contact lithography based on optical superlensing at 193 nm
Agency / Branch: DOD / DARPA
Contract: W31P4Q-08-C-0188
Award Amount: $98,979.00
 

Abstract:

We are proposing the development of a "negative-index" material at 193 nm for use as a "superlens" for high resolution lithography. Superlensing has already been demonstrated at 365 nm, and this work will simply extend the demonstrated principles to 193 nm with a new set of materials.In Phase I, we will demonstrate this superlens with 30 nm half-pitch features, while restricting ourselves to a contact mask. In Phase II, we will extend the scheme to non-contact lithography based on superlensing at 193 nm.

Principal Investigator:

Ravi Verma
Scientist
6264719700
ravi.verma@tanner.com

Business Contact:

Kevin Dinniene
Controller
6264719778
kevin@tanner.com
Small Business Information at Submission:

TANNER RESEARCH, INC.
825 S. Myrtle Ave. Monrovia, CA 91016

EIN/Tax ID: 954163780
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No