Utilizing Nonlocal Effects for Development of Novel Technologies for Plasma Chemistry and Laser Applications
Agency / Branch:
DOD / USAF
UES proposes to develop and perfect a new method of controlling plasma parameters based on nonlocal nature of the electron energy distribution function in the pulsed plasmas, i.e., develop nonlocal plasma technology (NLP technology). The NLP technology is based on application of nonlocal properties of fast electrons, which have energies essentially greater than the average electron energy. Particular attention will be paid to electronegative plasma and to the role of negative ions on fast electron density. The overall tasks during the Phase I are (a) Perform theoretical analysis of volumetric processes responsible for production of fast electrons and negative ions in electronegative plasmas; (b) Complete numerical simulations of density profiles of charged particles, including fast electrons and negative ions, in oxygen and oxygen-argon mixture plasmas. Analyze fluxes of fast electrons and ions to the walls with the purpose to demonstrate the self-trapping effects; (c) Conduct initial experimental measurements of ion and electron density to benchmark the numerical simulations. The completion of the Phase I will provide validation of the NLP technology. Princeton Plasma Physics Laboratory will be a partner in this project.
Small Business Information at Submission:
Francis F. Williams, Jr.
Research Institution Information:
4401 Dayton-Xenia Road Dayton, OH 45432
Number of Employees:
PRINCETON PLASMA PHYSICS LABORATORY
P. O. Box 451
Princeton, NJ 08543
Richard J. Hawryluk
Federally funded R&D center (FFRDC)