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Company Information:

Company Name:
Voltaix, Inc
Address:
197 Meister Avenue
North Branch, NJ 08876-1303
Phone:
(908) 231-9060
URL:
N/A
EIN:
N/A
DUNS:
173293994
Number of Employees:
65
Woman-Owned?:
No
Minority-Owned?:
No
HUBZone-Owned?:
No

Commercialization:

Has been acquired/merged with?:
N/A
Has had Spin-off?:
N/A
Has Had IPO?:
N/A
Year of IPO:
N/A
Has Patents?:
N/A
Number of Patents:
N/A
Total Sales to Date $:
$ 0.00
Total Investment to Date $
$ 0.00
POC Title:
N/A
POC Name:
N/A
POC Phone:
N/A
POC Email:
N/A
Narrative:
N/A

Award Totals:

Program/Phase Award Amount ($) Number of Awards
SBIR Phase I $99,970.00 2
STTR Phase I $98,596.00 1
STTR Phase II $498,909.00 1

Award List:

EXPERIMENTAL EVALUATION OF THE SYNTHETIC SOLID ELECTROLYTE INTERFACE CONCEPT FOR THE PRIMARY CA-SOCL2 BATTERY SYSTEM

Award Year / Program / Phase:
1988 / SBIR / Phase I
Award Amount:
$49,970.00
Agency / Branch:
DOD / ARMY
Principal Investigator:
John p de neufville
Abstract:
The ca-socl(2) battery chemistry is an excellant candidate to provide safe operation in batteries significiantly larger than 1 kg operate at steady rates greater than the "c" rate in army applications requiring high energy density batteries. progress has been made on optimizing the electrolyte… More

PRECURSORS FOR ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION OF COMPOUND SEMICONDUCTORS

Award Year / Program / Phase:
1989 / SBIR / Phase I
Award Amount:
$50,000.00
Agency / Branch:
DOD / DARPA
Principal Investigator:
John P De Neufville
Abstract:
The chemical vapor deposition of compound semiconductors requires volatile precursor molecules, usually organometallic (om) liquids or metal hydride (mh) gases, which can be thermally decomposed on a heated substrate to produce the requisite epitaxial material growth. an inherent disadvantage with… More

STTR Phase I: Germyl Silanes - Enabling Precursors for Chemical Vapor Deposition of Advanced CMOS Substrates, CMOS-Integrated MEMS, and Nano-Scale Quantum-Dot Silicon Photonics

Award Year / Program / Phase:
2006 / STTR / Phase I
Award Amount:
$98,596.00
Agency:
NSF
Principal Investigator:
Research Institution:
AZ State Univ
RI Contact:
John Kouvetakis
Abstract:
This Small Business Technology Transfer (STTR) Phase I project constitutes the first step in the commercialization of an innovation in the manufacture of advanced complementary metal oxide (CMOS) semiconductor substrates, CMOS-integrated micro-electro-mechanical systems (MEMS), thin film amorphous… More

STTR Phase II: Germyl Silanes - Enabling Precursors for Chemical Vapor Deposition of Advanced CMOS Substrates, CMOS-Integrated MEMS, and Nano-Scale Quantum-Dot Silicon Phot

Award Year / Program / Phase:
2008 / STTR / Phase II
Award Amount:
$498,909.00
Agency:
NSF
Principal Investigator:
Research Institution:
Arizona State University
RI Contact:
John Kouvetakis
Abstract:
This Small Business Technology Transfer Phase II project will demonstrate pilot scale manufacture of germyl silane precursors and their use to create prototype semiconductor devices and thin films under low temperature and selective growth processing conditions. The project addresses a critical need… More