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Company Information:
Name:
Voltaix, Inc
Address:
197 Meister Avenue
North Branch, NJ 08876-1303
North Branch, NJ 08876-1303
Located in HUBZone:
No
Woman-Owned:
No
Minority-Owned:
No
URL:
N/A
Phone:
(908) 231-9060
Award Totals:
Award List:
EXPERIMENTAL EVALUATION OF THE SYNTHETIC SOLID ELECTROLYTE INTERFACE CONCEPT FOR THE PRIMARY CA-SOCL2 BATTERY SYSTEM
Award Year / Program / Phase:
1988 / SBIR / Phase I
Agency / Branch:
DOD / ARMY
Principal Investigator:
John p de neufville
Award Amount:
$49,970.00
Abstract:
The ca-socl(2) battery chemistry is an excellant candidate to provide safe operation in batteries significiantly larger than 1 kg operate at steady rates greater than the "c" rate in army applications requiring high energy density batteries. progress has been made on optimizing the electrolyte… More
PRECURSORS FOR ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION OF COMPOUND SEMICONDUCTORS
Award Year / Program / Phase:
1989 / SBIR / Phase I
Agency / Branch:
DOD / DARPA
Principal Investigator:
John P De Neufville
Award Amount:
$50,000.00
Abstract:
The chemical vapor deposition of compound semiconductors requires volatile precursor molecules, usually organometallic (om) liquids or metal hydride (mh) gases, which can be thermally decomposed on a heated substrate to produce the requisite epitaxial material growth. an inherent disadvantage with… More
STTR Phase I: Germyl Silanes - Enabling Precursors for Chemical Vapor Deposition of Advanced CMOS Substrates, CMOS-Integrated MEMS, and Nano-Scale Quantum-Dot Silicon Photonics
Award Year / Program / Phase:
2006 / STTR / Phase I
Agency:
NSF
Research Institution:
AZ State Univ
Principal Investigator:
Matthew D. Stephens, Dr
Award Amount:
$98,596.00
RI Contact:
John Kouvetakis
Abstract:
This Small Business Technology Transfer (STTR) Phase I project constitutes the first step in the commercialization of an innovation in the manufacture of advanced complementary metal oxide (CMOS) semiconductor substrates, CMOS-integrated micro-electro-mechanical systems (MEMS), thin film amorphous… More
STTR Phase II: Germyl Silanes - Enabling Precursors for Chemical Vapor Deposition of Advanced CMOS Substrates, CMOS-Integrated MEMS, and Nano-Scale Quantum-Dot Silicon Phot
Award Year / Program / Phase:
2008 / STTR / Phase II
Agency:
NSF
Research Institution:
Arizona State University
Principal Investigator:
Matthew D. Stephens, PhD
Award Amount:
$498,909.00
RI Contact:
John Kouvetakis
Abstract:
This Small Business Technology Transfer Phase II project will demonstrate pilot scale manufacture of germyl silane precursors and their use to create prototype semiconductor devices and thin films under low temperature and selective growth processing conditions. The project addresses a critical need… More