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Company Information:

Company Name: On-Line Technologies, Inc
City: East Hartford
State: CT
Zip+4: 06108
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
Website URL: N/A
Phone: (806) 209-0719

Award Totals:

Program/Phase Award Amount ($) Number of Awards
SBIR Phase I $702,440.00 9
SBIR Phase II $1,495,504.00 3

Award List:

A Small, Light, Weight, Low Power, Low Cost, FT-IR Spectrometer

Award Year / Program / Phase: 1997 / SBIR / Phase I
Agency / Branch: DOD / MDA
Principal Investigator: Dr. Anthony S.bonanno
Award Amount: $59,861.00
Abstract:
There are many military, commercial, and medical applications for a small, rugged, and inexpensive infrared (IR) spectrometer. A Fourier Transform Infrared (FT-IR) spectrometer would be an ideal tool for such measurements; however, FT-IR spectrometers are very sensitive to vibration and subject to… More

SBIR Phase I: Development of a Cell Controller for Epitaxial Silicon Fabrication

Award Year / Program / Phase: 1997 / SBIR / Phase I
Agency: NSF
Principal Investigator: Peter Rosenthal
Award Amount: $74,939.00

A Small, Light, Weight, Low Power, Low Cost, FT-IR Spectrometer

Award Year / Program / Phase: 1998 / SBIR / Phase II
Agency / Branch: DOD / MDA
Principal Investigator: Dr. Anthony S.bonanno
Award Amount: $700,000.00
Abstract:
There are many military, commercial, and medical applications for a small, rugged, and inexpensive infrared (IR) spectrometer. A Fourier Transform Infrared (FT-IR) spectrometer would be an ideal tool for such measurements; however, FT-IR spectrometers are very sensitive to vibration and subject to… More

Real-Time Whole Wafer Thermal Imaging for Semiconductor Process Monitoring

Award Year / Program / Phase: 1998 / SBIR / Phase I
Agency / Branch: DOD / USAF
Principal Investigator: Dr. Peter A. Rosenthal
Award Amount: $99,898.00
Abstract:
This program will develop a whole wafer sensor for in situ monitoring and control of temperature during thermally assisted film processes such as rapid thermal processing (RTP), Metallorganic shemical vapor depostition (MOCVD), molecular beam epitaxy (MBE), pulsed laser deposition (PLD), and… More

Development of a Cell Controller for Epitaxial Silicon Fabrication

Award Year / Program / Phase: 1998 / SBIR / Phase II
Agency: NSF
Principal Investigator: Peter Rosenthal
Award Amount: $395,521.00

Method & Instrumentation for Thick-Film SOI Non-Destructive Characterization

Award Year / Program / Phase: 1999 / SBIR / Phase I
Agency / Branch: DOD / USAF
Principal Investigator: Victor Yakovlev
Award Amount: $98,225.00

In-Situ, Real-Time Process Control for Micro-Electro-Mechanical System (MEMS) Applications

Award Year / Program / Phase: 1999 / SBIR / Phase I
Agency: NSF
Principal Investigator: Sylvia Charpenay
Award Amount: $99,946.00

In-Situ Characterization of Photresist Properties by Fourier Trnasform Infrared Based IR Spectroscopy

Award Year / Program / Phase: 1999 / SBIR / Phase I
Agency: NSF
Principal Investigator: Matthew Richter
Award Amount: $99,699.00

N/A

Award Year / Program / Phase: 2000 / SBIR / Phase I
Agency: NSF
Principal Investigator: Jiazhan Xu
Award Amount: $99,983.00

N/A

Award Year / Program / Phase: 2000 / SBIR / Phase I
Agency: NSF
Principal Investigator: Sylvie Charpenay
Award Amount: $0.00

N/A

Award Year / Program / Phase: 2000 / SBIR / Phase II
Agency: NSF
Principal Investigator: Sylvie Charpenay
Award Amount: $399,983.00

Exhaust Gas Monitoring for Process Control and Pollution Reduction in Semiconductor Manufacturing

Award Year / Program / Phase: 2001 / SBIR / Phase I
Agency: EPA
Principal Investigator: Martin Spartz
Award Amount: $69,889.00
Abstract:
Perfluorocarbons (PFCs), known greenhouse gases, are used widely in semiconductor manufacturing. Several options for reducing the emissions of PFCs are being considered, including: (1) optimizing the process; (2) reducing the nonproduction operation of the fabrication tool; (3) recovering and… More