Award Year / Program / Phase:
2011 / STTR / Phase I
Agency / Branch:
DOD / OSD
Research Institution:
Georgia Institute of Technology
In this STTR proposal, we propose to develop a cost-effective and high-fidelity nanoimprint process for the fabrication of integrated photonics devices. VLSI photonics applications require a hig-level of control on device-to-device uniformity. Nanoimprint lithography (NIL) holds promise to overcome…
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