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Roll-to-Roll Printing of Patterned Nanomembranes on Flexible Substrates

Award Information

Agency:
Department of Defense
Branch:
Office of the Secretary of Defense
Award ID:
Program Year/Program:
2011 / STTR
Agency Tracking Number:
O10B-005-1033
Solicitation Year:
2010
Solicitation Topic Code:
OSD10-T005
Solicitation Number:
2010.B
Small Business Information
systeMech
325 S. Hamilton St. #205 Madison, WI 53703-4014
View profile »
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 2011
Title: Roll-to-Roll Printing of Patterned Nanomembranes on Flexible Substrates
Agency / Branch: DOD / OSD
Contract: FA9550-11-C-0059
Award Amount: $100,000.00
 

Abstract:

The objective of this phase I STTR project is to develop and demonstrate a roll-to-roll process for printing semiconductor and metal nanostructures with lateral dimensions as small as 100 nm on flexible substrates. systeMech will collaborate with the University of Wisconsin-Madison (Prof. M.G. Lagally"s group) to develop and characterize a process for transferring semiconductor and metal nanomembranes, which have been patterned via nanoimprint lithography at the wafer-level, to flexible substrates. The transfer of nanostructures patterned at the wafer-level has significant advantages over direct nanoimprinting, including better etching capabilities and fewer distortion problems. The primary objectives for phase I are: (1) Demonstrating retrieval of patterned nanostructures using a rotating stamp, (2) Demonstrating printing of nanostructures on flexible substrates using a rotating stamp, and (3) Designing a complete roll-to-roll manufacturing process capable of patterning>0.1 square meters. These objectives will be accomplished through mechanical modeling of the manufacturing process, retrieval and printing experiments, and process characterization. systeMech is a newly-formed small business, and the founders have experience in semiconductor manufacturing, mechanics, and nanoengineering. Prof. Max Lagally at the University of Wisconsin-Madison is a leader in nanomembrane processing for electronic and photonic devices and currently leads an AFOSR-funded MURI on nanomembranes.

Principal Investigator:

David Grierson
Principal
(608) 217-9700
dsgrierson@systemech.com

Business Contact:

David Grierson
Principal
(608) 217-9700
dsgrierson@systemech.com
Small Business Information at Submission:

systeMech
325 S. Hamilton St. #205 Madison, WI 53703-4014

EIN/Tax ID: 398989556
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
Research Institution Information:
University of Wisconsin-Madison
Research and Sponsored Program
21 N. Park Street, Suite 6401
Madison, WI 53715-1218
Contact: Kim Moreland
Contact Phone: (608) 262-3822