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Technologies for Nanoscale Imaging Using Coherent Extreme Ultraviolet and Soft…

Award Information

Agency:
Department of Defense
Branch:
Air Force
Award ID:
Program Year/Program:
2012 / STTR
Agency Tracking Number:
F11B-T11-0028
Solicitation Year:
2011
Solicitation Topic Code:
AF11-BT11
Solicitation Number:
2011.B
Small Business Information
KAPTEYN-MURNANE LABORATORIES, INC.
1855 South 57th Court Boulder, CO -
View profile »
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 2012
Title: Technologies for Nanoscale Imaging Using Coherent Extreme Ultraviolet and Soft X-Ray Light
Agency / Branch: DOD / USAF
Contract: FA9550-12-C-0051
Award Amount: $99,964.00
 

Abstract:

ABSTRACT: Microscopy is a critical enabling technology for advancing our understanding of nature. Imaging nanoscale objects with light in the extreme ultraviolet (EUV) and soft x-ray regions of the spectrum has advantages over visible light for resolution, elemental specificity, and imaging internal structures. Coherent diffractive imaging (CDI) has been developed as a tool to get around the limitations of available x-ray optics. In recent years CDI has shown very high, near wavelength resolution when used with EUV light from high harmonic upconversion from ultrafast lasers. We propose to develop a complete tabletop EUV microscope instrument that is tunable in wavelength from 30 to 2.5nm (40 to 500 eV). The key to creating a practical instrument will be developing a driving laser that is specifically tailored to driving high harmonic generation that is phase matched over this entire wavelength range, while requiring little alignment and maintenance. In Phase I we will design a driving laser based on fiber and operating at 1560 nm wavelength, and qualify key aspects of the design. This microscope will have broad application in basic research, materials studies, lithography, and medicine. BENEFIT: The microscope to be developed under this program will have broad application in basic research, materials studies, lithography, and medicine. It will have the capability to do at-wavelength mask inspection for semiconductor lithography at 13.5 nm. It will be able to do full-field imaging of whole, unstained cells without the need for sectioning, with resolution of ~10nm or better. This microscope should find a broad commercial market in addition to the DoD needs for nano-materials identification and battlefield medicine.

Principal Investigator:

Daisy Raymondson
Research Scientist
(303) 544-9068
draymondson@kmlabs.com

Business Contact:

Sterling Backus
VP of Research and Development
(303) 544-9068
sbackus@kmlabs.com
Small Business Information at Submission:

Kapteyn-Murnane Laboratories Inc.
1855 South 57th Court Boulder, CO 80301-

EIN/Tax ID: 911658577
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
Research Institution Information:
JILA
University of Colorado
Boulder, CO 80309-
Contact: Randall W. Draper
Contact Phone: (303) 492-2695